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Yanqiu Li

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20002024

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  • 2014

    Design of freeform illumination sources with arbitrary polarization for immersion lithography

    Wei, L., Li, Y. & Liu, K., 2014, Optical Design and Testing VI. Du, C., Sasian, J., Wang, Y. & Tatsuno, K. (eds.). SPIE, 927221. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 9272).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

    3 Citations (Scopus)

  • Efficient source polarization optimization for robust optical lithography

    Ma, X., Gao, J., Han, C., Li, Y., Dong, L. & Liu, L., 2014, Optical Microlithography XXVII. SPIE, 90520T. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 9052).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

    10 Citations (Scopus)

  • Measuring the polarization aberration of hyper-NA lens from the vector aerial image

    Dong, L., Li, Y., Dai, X., Liu, H. & Liu, K., 2014, 7th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design Manufacturing, and Testing of Micro- and Nano-Optical Devices, and Systems. Poleshchuk, A. G., Ye, T. & Hu, S. (eds.). SPIE, 928313. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 9283).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

    11 Citations (Scopus)

  • Optimized imaging polarimeter for measuring polarization properties of hyper number aperture lithography tools

    Li, L., Li, Y., Chi, Q., Liu, K., Zhang, X. & Li, J., 2014, 7th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment. Zhang, Y. & Gao, W. (eds.). SPIE, 928232. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 9282).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

    15 Citations (Scopus)

  • Polarization aberration compensation method by adjusting illumination partial coherent factors in immersion lithography

    Jia, Y., Li, Y., Liu, L., Han, C. & Liu, X., 2014, Nanophotonics and Micro/Nano Optics II. Zhou, Z. & Wada, K. (eds.). SPIE, 92770Z. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 9277).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

    2 Citations (Scopus)
  • 2013

    A reverse design method for EUV lithography illumination system

    Mei, Q., Li, Y. & Liu, F., 2013, Extreme Ultraviolet (EUV) Lithography IV. 867923. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 8679).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

    7 Citations (Scopus)

  • A technique for extracting and analyzing the polarization aberration of hyper-numerical aperture image optics

    Li, Y., Guo, X., Liu, X. & Liu, L., 2013, 2013 International Conference on Optical Instruments and Technology: Optical Systems and Modern Optoelectronic Instruments. SPIE, 904204. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 9042).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

    12 Citations (Scopus)

  • Reduction of image optics dependence of resist image performance for high NA extreme ultraviolet lithography

    Chun, O., Li, Y. & Liu, L., 2013, 2013 International Conference on Optical Instruments and Technology: Optical Systems and Modern Optoelectronic Instruments. SPIE, 90421J. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 9042).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

    1 Citation (Scopus)

  • The application of variable universe fuzzy PID controller in computer-aided alignment of lithography projector

    Zhang, M., Zheng, M. & Li, Y., 2013, 2013 International Conference on Optical Instruments and Technology: Optoelectronic Measurement Technology and Systems. SPIE, 90460H. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 9046).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

    1 Citation (Scopus)

  • Two methods to loosen optical manufacture tolerances for ArF projection optics

    Liu, X., Li, Y., Liu, K. & Wei, L., 2013, Advances in Optics Manufacture. Trans Tech Publications Ltd., p. 502-509 8 p. (Key Engineering Materials; vol. 552).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

    1 Citation (Scopus)
  • 2012

    Analysis and control of thermal and structural deformation of projection optics for 22 nm EUV lithography

    Yang, G. & Li, Y., 2012, Extreme Ultraviolet (EUV) Lithography III. 83222V. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 8322).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

    9 Citations (Scopus)

  • Detailed illuminator design for full field ArF lithography system with a method based on the fly's eye

    Wei, L., Li, Y. & Liu, L., 2012, Optical Systems Design 2012. 855032. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 8550).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

    5 Citations (Scopus)

  • Gradient-based resolution enhancement optimization methods based on vector imaging model

    Ma, X., Li, Y. & Dong, L., 2012, Optical Microlithography XXV. 83262B. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 8326).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

    2 Citations (Scopus)

  • High numerical aperture Hartmann wavefront sensor with pinhole array extended source

    Liu, K., Li, Y., Zheng, M., Wang, H. & Liu, B., 2012, Optical Systems Design 2012. 85503M. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 8550).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

    2 Citations (Scopus)

  • Illuminator design for small field ArF lithography system

    Wei, L., Li, Y., Liu, K. & Liu, X., 2012, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies. 84160I. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 8416).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

    1 Citation (Scopus)

  • Impact of MSD and mask manufacture errors on 45nm-node lithography

    Han, C., Li, Y., Liu, L., Guo, X., Wang, X. & Yang, J., 2012, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Smart Structures, Micro- and Nano-Optical Devices, and Systems. 84180B. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 8418).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

    2 Citations (Scopus)

  • Impact of non-uniform polarized illumination on hyper-NA lithography

    Guo, X. & Li, Y., 2012, Optical Microlithography XXV. 832623. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 8326).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

    1 Citation (Scopus)

  • Improved wavefront reconstruction using difference Zernike polynomials for two double-shearing wavefronts

    Wang, H., Li, Y., Liu, K. & Wang, J., 2012, Optical Systems Design 2012. 855013. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 8550).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

    4 Citations (Scopus)

  • Influence of flare and NA error on lithography

    Wang, X., Liu, L., Li, Y., Guo, X., Han, C. & Yang, J., 2012, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Smart Structures, Micro- and Nano-Optical Devices, and Systems. 84180C. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 8418).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

  • Robust resolution enhancement optimization methods to process variations based on vector imaging model

    Ma, X., Li, Y., Guo, X. & Dong, L., 2012, Optical Microlithography XXV. 83262A. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 8326).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

    5 Citations (Scopus)

  • Simulation of sub-wavelength 3D photomask induced polarization effect by RCWA

    Yang, L., Li, Y., Liu, L. & Wang, J., 2012, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Smart Structures, Micro- and Nano-Optical Devices, and Systems. 841815. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 8418).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

    3 Citations (Scopus)

  • The cross talk of multi-errors impact on lithography performance and the method of its control

    Li, Y., Han, C., Guo, X., Liu, L., Wang, X. & Yang, J., 2012, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Smart Structures, Micro- and Nano-Optical Devices, and Systems. 841802. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 8418).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

    2 Citations (Scopus)

  • Three-dimensional polarization aberration in hyper-numerical aperture lithography optics

    Wang, J. & Li, Y., 2012, Optical Microlithography XXV. 832624. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 8326).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

    6 Citations (Scopus)

  • Two-dimensional interferogram extrapolation method using linear carrier-frequency

    Wang, H., Li, Y., Liu, K. & Wang, J., 2012, 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment. 841709. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 8417).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

    3 Citations (Scopus)
  • 2011

    Comparison of wavefront reconstruction with modal method and zonal method for the inspection of catadioptric projection optics using Hartmann wavefront sensor

    Wang, J., Liu, K., Li, Y., Wang, H. & Li, G., 2011, 2011 International Conference on Optical Instruments and Technology: Optical Systems and Modern Optoelectronic Instruments. 81970A. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 8197).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

    1 Citation (Scopus)
  • 2009

    A high-efficiency energy storage scheme of solar micro-power systems

    He, Y. T., Liu, L. H., Li, Y. Q. & Lei, W., 2009, Micro and Nano Technology - 1st International Conference Society of Micro/Nano Technology, CSMNT. Trans Tech Publications, p. 74-78 5 p. (Advanced Materials Research; vol. 60-61).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

    3 Citations (Scopus)

  • Development of a 20X Schwarzschild projection optics for principle experiment of EUV at-wavelength interferometry

    Liu, K. & Li, Y., 2009, 4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems. 72840E. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 7284).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

    5 Citations (Scopus)
  • 2008

    Design and investigation of photovoltaic and thermoelectric hybrid power source for wireless sensor networks

    Yu, H., Li, Y., Shang, Y. & Su, B., 2008, 3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2008. p. 196-201 6 p. 4484317. (3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

    34 Citations (Scopus)

  • Impact of source polarization on the imaging of line and space features at 45nm half pitch node

    Yuan, Z. & Li, Y., 2008, Quantum Optics, Optical Data Storage, and Advanced Microlithography. 68271P. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 6827).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

  • The application of partial differential euqation in interferogram denoising

    Liu, J., Li, Y. & Liu, K., 2008, International Symposium on Photoelectronic Detection and Imaging 2007 - Image Processing. 662325. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 6623).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

    1 Citation (Scopus)
  • 2007

    A comparison study of tantalum-nitrogen and chromium absorber in extreme ultraviolet mask fabrication using electron-beam lithography simulation

    Guorong, Z. & Yanqiu, L., 2007, Photomask and Next-Generation Lithography Mask Technology XIV. PART 2 ed. 66073C. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 6607, no. PART 2).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

    1 Citation (Scopus)

  • Experimental investigation on thermoelectric generator of micro hybrid power source

    Shang, Y., Li, Y., Yu, H., Sun, H. & Su, B., 2007, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems. 672412. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 6724).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

    3 Citations (Scopus)

  • Impact of molybdenum/silicon multilayer structure on extreme ultraviolet mask fabrication

    Zhao, G. & Li, Y., 2007, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems. 672411. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 6724).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

  • Influence of polarization on the optimization of dual BARC structures for hyper-numerical aperture ArF immersion lithography

    Yuan, Z., Yanqiu, L. & Qiang, Z., 2007, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems. 67240Y. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 6724).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

    2 Citations (Scopus)

  • Interferogram region extrapolation technology by exemplar-based image inpainting

    Liu, J., Li, Y. & Liu, K., 2007, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment. 67234R. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 6723).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

    2 Citations (Scopus)

  • Novel fabrication technology of polydimethylsiloxane microfluidic chip

    Su, B., Li, Y. & Sun, H., 2007, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems. 672410. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 6724).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

  • Option of resolution enhancement technology in advanced lithography

    Yanqiu, L. & Yuan, Z., 2007, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems. 67240G. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 6724).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

    4 Citations (Scopus)

  • Resolution enhancement technology for ArF dry lithography at 65 nm node

    Songbo, G. & Yanqiu, L., 2007, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems. 67240Z. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 6724).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

  • 2006

    Advanced lithography technology in IEECAS

    Li, Y., 2006, Proceedings of the 5th International Conference on Semiconductor Technology, ISTC 2006. p. 630-643 14 p. (Proceedings - Electrochemical Society; vol. PV 2006-03).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

  • Study on control strategy of wafer stage and reticle stage of EUVL

    Zhu, T. & Li, Y., 2006, Proceedings of SPIE - The International Society for Optical Engineering. 61492V. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 6149).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

    6 Citations (Scopus)

  • The effects of RET on process capability for 45nm technology node

    Zhang, F. & Li, Y., 2006, Proceedings of SPIE - The International Society for Optical Engineering. 61490T. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 6149).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

  • The impact of flare, polarized light and aberration on CD uniformity of butting pattern and CD control

    Zhang, F. & Li, Y., 2006, Proceedings of 1st IEEE International Conference on Nano Micro Engineered and Molecular Systems, 1st IEEE-NEMS. p. 21-24 4 p. 4134895. (Proceedings of 1st IEEE International Conference on Nano Micro Engineered and Molecular Systems, 1st IEEE-NEMS).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review