TY - GEN
T1 - Simulation of sub-wavelength 3D photomask induced polarization effect by RCWA
AU - Yang, Liang
AU - Li, Yanqiu
AU - Liu, Lihui
AU - Wang, Jianfeng
PY - 2012
Y1 - 2012
N2 - In 45nm technology node and beyond with hyper NA and Off-axis Illumination (OAI) lithography, mask induced polarization effect is remarkable. At this scale, traditional Kirchhoff approximation, in which the masks are considered to be infinitely thin objects, is no longer valid. Rigorous three-dimensional (3D) mask model is required for precise evaluation of mask diffraction. In this paper, a general 3D mask model based on the rigorous coupled-wave analysis (RCWA) is presented, and the change of polarization state as a function of mask and incident light properties is evaluated. The masks considered are the binary chrome mask and 10% Si-Si3N4 attenuated phase shifting mask. The results show that the mask induced polarization effects depend on the mask and incident light properties, such as mask material, absorber thickness, mask pitch, feature size, the polarization and incident angle of the light.
AB - In 45nm technology node and beyond with hyper NA and Off-axis Illumination (OAI) lithography, mask induced polarization effect is remarkable. At this scale, traditional Kirchhoff approximation, in which the masks are considered to be infinitely thin objects, is no longer valid. Rigorous three-dimensional (3D) mask model is required for precise evaluation of mask diffraction. In this paper, a general 3D mask model based on the rigorous coupled-wave analysis (RCWA) is presented, and the change of polarization state as a function of mask and incident light properties is evaluated. The masks considered are the binary chrome mask and 10% Si-Si3N4 attenuated phase shifting mask. The results show that the mask induced polarization effects depend on the mask and incident light properties, such as mask material, absorber thickness, mask pitch, feature size, the polarization and incident angle of the light.
KW - RCWA
KW - lithography simulation
KW - polarization effects
KW - sub-wavelength
UR - http://www.scopus.com/inward/record.url?scp=84875635639&partnerID=8YFLogxK
U2 - 10.1117/12.978258
DO - 10.1117/12.978258
M3 - Conference contribution
AN - SCOPUS:84875635639
SN - 9780819491008
T3 - Proceedings of SPIE - The International Society for Optical Engineering
BT - 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies
T2 - 6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Smart Structures, Micro- and Nano-Optical Devices, and Systems
Y2 - 26 April 2012 through 29 April 2012
ER -