@inproceedings{408a2c0b10c54c2baca967a310399a8a,
title = "Polarization aberration compensation method by adjusting illumination partial coherent factors in immersion lithography",
abstract = "As the numerical aperture (NA) increasing and process factor k1 decreasing in 193nm immersion lithography, polarization aberration (PA) of projection optics leads to image quality degradation seriously. Therefore, this work proposes a new scheme for compensating polarization aberration. By simulating we found that adjusting the illumination source partial coherent factors σout is an effective method for decreasing the PA induced pattern critical dimension (CD) error while keeping placement error (PE) within an acceptable range. Our simulation results reveal that the proposed method can effectively compensate large PA in actual optics.",
keywords = "Polarization aberration, compensation, illumination source partial coherent factor., immersion lithography, projection optics",
author = "Yue Jia and Yanqiu Li and Lihui Liu and Chunying Han and Xiaolin Liu",
note = "Publisher Copyright: {\textcopyright} 2014 SPIE.; Nanophotonics and Micro/Nano Optics II ; Conference date: 09-10-2014 Through 11-10-2014",
year = "2014",
doi = "10.1117/12.2087529",
language = "English",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
publisher = "SPIE",
editor = "Zhiping Zhou and Kazumi Wada",
booktitle = "Nanophotonics and Micro/Nano Optics II",
address = "United States",
}