Construction of heat resistance devices for Escherichia coli and their application

Xiangying Sun, Yueqin Liu, Huan Sun, Haiyang Jia, Dazhang Dai, Chun Li*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)

Abstract

To improve the heat resistance of Escherichia coli, an inducible heat-resistance device T7-T.te-HSP20 and a constitutive heat-resistance device gapA-T. te-HSP20 based on T. te-HSP20 gene from Thermoanaerobacter tengcongensis MB4, and corresponding engineered strains E. coli-TH and E. coli-GH were constructed. The targeted protein was expressed in solubility after IPTG induction at 30℃ in E. coli-TH. Meanwhile, the survival rate of E. coli-TH was 3.2 times higher than the control at 50℃ for 30 min. The result of high-temperature fermentation showed that the optimum temperature range of E. coli-GH was broadened (37-43℃) under the regulation of heat resistance device gapA-T. te-HSP20. Stress resistance analysis showed that E. coli-GH not only possessed heat resistance and butanol resistance, but also had some resistance to acetic acid and ethanol. These results provide a new idea for modern microorganisms industry.

Original languageEnglish
Pages (from-to)3128-3135
Number of pages8
JournalHuagong Xuebao/CIESC Journal
Volume65
Issue number8
DOIs
Publication statusPublished - 1 Aug 2014

Keywords

  • Escherichia coli
  • Heat resistance
  • Heat shock protein (HSP)
  • Stress resistance
  • Survival rate

Fingerprint

Dive into the research topics of 'Construction of heat resistance devices for Escherichia coli and their application'. Together they form a unique fingerprint.

Cite this