Construction of heat resistance devices for Escherichia coli and their application

Xiangying Sun, Yueqin Liu, Huan Sun, Haiyang Jia, Dazhang Dai, Chun Li*

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摘要

To improve the heat resistance of Escherichia coli, an inducible heat-resistance device T7-T.te-HSP20 and a constitutive heat-resistance device gapA-T. te-HSP20 based on T. te-HSP20 gene from Thermoanaerobacter tengcongensis MB4, and corresponding engineered strains E. coli-TH and E. coli-GH were constructed. The targeted protein was expressed in solubility after IPTG induction at 30℃ in E. coli-TH. Meanwhile, the survival rate of E. coli-TH was 3.2 times higher than the control at 50℃ for 30 min. The result of high-temperature fermentation showed that the optimum temperature range of E. coli-GH was broadened (37-43℃) under the regulation of heat resistance device gapA-T. te-HSP20. Stress resistance analysis showed that E. coli-GH not only possessed heat resistance and butanol resistance, but also had some resistance to acetic acid and ethanol. These results provide a new idea for modern microorganisms industry.

源语言英语
页(从-至)3128-3135
页数8
期刊Huagong Xuebao/CIESC Journal
65
8
DOI
出版状态已出版 - 1 8月 2014

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Sun, X., Liu, Y., Sun, H., Jia, H., Dai, D., & Li, C. (2014). Construction of heat resistance devices for Escherichia coli and their application. Huagong Xuebao/CIESC Journal, 65(8), 3128-3135. https://doi.org/10.3969/j.issn.0438-1157.2014.08.038