Crystallographically tilted and partially strain relaxed GaN grown on inclined {111} facets etched on Si(100) substrate

K. K.Ansah Antwi, C. B. Soh, Q. Wee, Rayson J.N. Tan, P. Yang, H. R. Tan, L. F. Sun, Z. X. Shen, S. J. Chua*

*此作品的通讯作者

科研成果: 期刊稿件文章同行评审

10 引用 (Scopus)

指纹

探究 'Crystallographically tilted and partially strain relaxed GaN grown on inclined {111} facets etched on Si(100) substrate' 的科研主题。它们共同构成独一无二的指纹。

Engineering

Earth and Planetary Sciences

Material Science