Plasmonic properties of nonstoichiometric zirconium nitride, oxynitride thin films, and their bilayer structures

Qian Guo, Tianrun Wang, Yuehong Ren, Yujing Ran, Chang Gao, Huiping Lu, Zhaotan Jiang, Zhi Wang*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

13 Citations (Scopus)

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