Plasmonic properties of nonstoichiometric zirconium nitride, oxynitride thin films, and their bilayer structures

Qian Guo, Tianrun Wang, Yuehong Ren, Yujing Ran, Chang Gao, Huiping Lu, Zhaotan Jiang, Zhi Wang*

*此作品的通讯作者

科研成果: 期刊稿件文章同行评审

13 引用 (Scopus)

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Material Science