Fabrication technique of nano-grating using AFM

Huimin Xie*, Zhanwei Liu, Ming Zhang, Wei Zhang, Anand Asundi

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Citation (Scopus)

Abstract

On the basis of the mechanically scratching using the Atomic Force Microscope, this paper proposes a new method for manufacturing high frequency grating. The grating was fabricated on a polycarbonate compact disc with a silicon AFM tip under the contact mode. The fabrication technique and the optimization of parameters for the technique are discussed in detail. From the experiment, the minimum spacing of the grating can reach 30 nm. The digital nano-moiré patterns verify that the grating has good potential to be applied to the nano-deformation measurement.

Original languageEnglish
Title of host publicationOptical Micro- and Nanometrology in Microsystems Technology
DOIs
Publication statusPublished - 2006
EventOptical Micro- and Nanometrology in Microsystems Technology - Strasbourg, France
Duration: 5 Apr 20067 Apr 2006

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume6188
ISSN (Print)0277-786X

Conference

ConferenceOptical Micro- and Nanometrology in Microsystems Technology
Country/TerritoryFrance
CityStrasbourg
Period5/04/067/04/06

Keywords

  • Atomic Force Microscope (AFM)
  • Digital moiré
  • Grating fabrication
  • Nano-grating
  • Nano-lithography

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