Fabrication technique of nano-grating using AFM

Huimin Xie; Zhanwei Liu; Ming Zhang; Wei Zhang; Anand Asundi

doi:10.1117/12.663058

Fabrication technique of nano-grating using AFM

Huimin Xie^*, Zhanwei Liu, Ming Zhang, Wei Zhang, Anand Asundi

^*此作品的通讯作者

宇航学院

科研成果: 书/报告/会议事项章节 › 会议稿件 › 同行评审

1 引用（Scopus）

摘要

On the basis of the mechanically scratching using the Atomic Force Microscope, this paper proposes a new method for manufacturing high frequency grating. The grating was fabricated on a polycarbonate compact disc with a silicon AFM tip under the contact mode. The fabrication technique and the optimization of parameters for the technique are discussed in detail. From the experiment, the minimum spacing of the grating can reach 30 nm. The digital nano-moiré patterns verify that the grating has good potential to be applied to the nano-deformation measurement.

源语言	英语
主期刊名	Optical Micro- and Nanometrology in Microsystems Technology
DOI	https://doi.org/10.1117/12.663058
出版状态	已出版 - 2006
活动	Optical Micro- and Nanometrology in Microsystems Technology - Strasbourg, 法国期限: 5 4月 2006 → 7 4月 2006

出版系列

姓名	Proceedings of SPIE - The International Society for Optical Engineering
卷	6188
ISSN（印刷版）	0277-786X

会议

会议	Optical Micro- and Nanometrology in Microsystems Technology
国家/地区	法国
市	Strasbourg
时期	5/04/06 → 7/04/06

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10.1117/12.663058

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Xie, H., Liu, Z., Zhang, M., Zhang, W., & Asundi, A. (2006). Fabrication technique of nano-grating using AFM. 在 Optical Micro- and Nanometrology in Microsystems Technology 文章 618807 (Proceedings of SPIE - The International Society for Optical Engineering; 卷 6188). https://doi.org/10.1117/12.663058

@inproceedings{0912fdc0fa454ba08cc7240bbc439d30,

title = "Fabrication technique of nano-grating using AFM",

abstract = "On the basis of the mechanically scratching using the Atomic Force Microscope, this paper proposes a new method for manufacturing high frequency grating. The grating was fabricated on a polycarbonate compact disc with a silicon AFM tip under the contact mode. The fabrication technique and the optimization of parameters for the technique are discussed in detail. From the experiment, the minimum spacing of the grating can reach 30 nm. The digital nano-moir{\'e} patterns verify that the grating has good potential to be applied to the nano-deformation measurement.",

keywords = "Atomic Force Microscope (AFM), Digital moir{\'e}, Grating fabrication, Nano-grating, Nano-lithography",

author = "Huimin Xie and Zhanwei Liu and Ming Zhang and Wei Zhang and Anand Asundi",

year = "2006",

doi = "10.1117/12.663058",

language = "English",

isbn = "0819462446",

series = "Proceedings of SPIE - The International Society for Optical Engineering",

booktitle = "Optical Micro- and Nanometrology in Microsystems Technology",

note = "Optical Micro- and Nanometrology in Microsystems Technology ; Conference date: 05-04-2006 Through 07-04-2006",

}

Xie, H, Liu, Z, Zhang, M, Zhang, W & Asundi, A 2006, Fabrication technique of nano-grating using AFM. 在 Optical Micro- and Nanometrology in Microsystems Technology., 618807, Proceedings of SPIE - The International Society for Optical Engineering, 卷 6188, Optical Micro- and Nanometrology in Microsystems Technology, Strasbourg, 法国, 5/04/06. https://doi.org/10.1117/12.663058

TY - GEN

T1 - Fabrication technique of nano-grating using AFM

AU - Xie, Huimin

AU - Liu, Zhanwei

AU - Zhang, Ming

AU - Zhang, Wei

AU - Asundi, Anand

PY - 2006

Y1 - 2006

N2 - On the basis of the mechanically scratching using the Atomic Force Microscope, this paper proposes a new method for manufacturing high frequency grating. The grating was fabricated on a polycarbonate compact disc with a silicon AFM tip under the contact mode. The fabrication technique and the optimization of parameters for the technique are discussed in detail. From the experiment, the minimum spacing of the grating can reach 30 nm. The digital nano-moiré patterns verify that the grating has good potential to be applied to the nano-deformation measurement.

AB - On the basis of the mechanically scratching using the Atomic Force Microscope, this paper proposes a new method for manufacturing high frequency grating. The grating was fabricated on a polycarbonate compact disc with a silicon AFM tip under the contact mode. The fabrication technique and the optimization of parameters for the technique are discussed in detail. From the experiment, the minimum spacing of the grating can reach 30 nm. The digital nano-moiré patterns verify that the grating has good potential to be applied to the nano-deformation measurement.

KW - Atomic Force Microscope (AFM)

KW - Digital moiré

KW - Grating fabrication

KW - Nano-grating

KW - Nano-lithography

UR - http://www.scopus.com/inward/record.url?scp=33746765101&partnerID=8YFLogxK

U2 - 10.1117/12.663058

DO - 10.1117/12.663058

M3 - Conference contribution

AN - SCOPUS:33746765101

SN - 0819462446

SN - 9780819462442

T3 - Proceedings of SPIE - The International Society for Optical Engineering

BT - Optical Micro- and Nanometrology in Microsystems Technology

T2 - Optical Micro- and Nanometrology in Microsystems Technology

Y2 - 5 April 2006 through 7 April 2006

ER -

Fabrication technique of nano-grating using AFM

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