大 数 值 孔 径（NA=0.55）变 倍 率 极 紫 外 光 刻 投 影物 镜 偏 振 像 差 高 精 度 检 测 方 法

Translated title of the contribution: High-Precision Measurement Method of Polarization Aberrations for Large Numerical Aperture (NA=0.55) Variable-Magnification Extreme Ultraviolet Lithography Projection Objective

Ang Li, Yanqiu Li*, Pengzhi Wei, Miao Yuan, Chengcheng Wang

*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

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