大 数 值 孔 径（NA=0.55）变 倍 率 极 紫 外 光 刻 投 影物 镜 偏 振 像 差 高 精 度 检 测 方 法

Engineering

• Numerical Aperture 100%
• Extreme-Ultraviolet Lithography 100%
• Nodes 33%
• Supports 33%
• Simulation Result 33%
• Artificial Neural Network 33%
• Deep Neural Network 33%
• Spatial Image 33%

Physics

• Lithography 100%
• Measurement Method 100%
• Numerical Aperture 100%
• Artificial Neural Network 33%

Chemical Engineering

• Lithography 100%
• Deep Neural Network 33%