Temperature-dependent transport and hysteretic behaviors induced by interfacial states in MoS2field-effect transistors with lead-zirconate-titanate ferroelectric gating

Yilin Sun, Dan Xie, Xiaowen Zhang, Jianlong Xu, Xinming Li, Xian Li, Ruixuan Dai, Xiao Li, Peilian Li, Xingsen Gao, Hongwei Zhu

Research output: Contribution to journalArticlepeer-review

28 Citations (Scopus)

Abstract

We report the temperature and gate-voltage-dependent electrical properties of lead-zirconate-titanate-gated MoS2 field-effect transistors (MoS2-PZT FETs) within a temperature range of 300 to 380 K. The MoS2 transistors with PZT gating exhibit large reproducible clockwise hysteresis, which is induced by the dynamic charge-trapping/de-trapping process of interfacial states between PZT films and MoS2 channels under the modulation of ferroelectric polarization of PZT films. In this way, the modulation of the gate effect on the hysteresis behavior has been achieved by activating the dynamic charge-trapping/de-trapping process in the interfacial states under different Vgs. Moreover, the temperature dependence of the current in the range of 300 to 380 K indicates thermally activated hysteretic behaviors. The hysteresis in the transfer characteristics of MoS2-PZT FETs shows a simultaneous enlargement with increasing temperature, which can be attributed to the thermally sensitive dynamic trapping/de-trapping process of interfacial states.

Original languageEnglish
Article number045204
JournalNanotechnology
Volume28
Issue number4
DOIs
Publication statusPublished - 27 Jan 2017
Externally publishedYes

Keywords

  • MoS
  • PZT
  • hysteresis
  • interfacial states
  • temperature dependence
  • transistor

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