Properties of Al-doped ZnO film transistors with different source and drain electrodes

Cheng Zhang, Dan Xie*, Jianlong Xu, Gang Li, Xiaowen Zhang, Yilin Sun, Yuanfan Zhao, Tingting Feng, Tianling Ren

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

We report the influences of Al doping and source/drain electrodes on the electrical performances of ZnO thin film transistors (TFTs).The electron mobility of Al-doped ZnO (AZO) films increases by two orders of magnitude with 1% Al doping, thus improving the performances of ZnO TFTs. TFTs with Ti/Pt source/drain electrodes exhibit better saturation and ON/OFF properties than that with Al electrodes, however, its drain current is relatively lower due to the Schottky structure formed between Pt/Ti and AZO layers.

Original languageEnglish
Title of host publicationProceedings - 2014 IEEE 12th International Conference on Solid-State and Integrated Circuit Technology, ICSICT 2014
EditorsJia Zhou, Ting-Ao Tang
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9781479932962
DOIs
Publication statusPublished - 23 Jan 2014
Externally publishedYes
Event2014 12th IEEE International Conference on Solid-State and Integrated Circuit Technology, ICSICT 2014 - Guilin, China
Duration: 28 Oct 201431 Oct 2014

Publication series

NameProceedings - 2014 IEEE 12th International Conference on Solid-State and Integrated Circuit Technology, ICSICT 2014

Conference

Conference2014 12th IEEE International Conference on Solid-State and Integrated Circuit Technology, ICSICT 2014
Country/TerritoryChina
CityGuilin
Period28/10/1431/10/14

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