@inproceedings{b2ee644316f647569d62c889af863325,
title = "Polarization aberration in-situ measurement in lithography tools",
abstract = "Polarization aberration of projection optics should be measured, controlled and compensated accurately in high numerical-aperture image optical system, such as lithography tools for technical node of 14-5 nm. In this paper, we develop a three-step eigenvalue calibration method for polarization aberration measurement in-situ accurately. The whole system and subsystems can be calibrated by using the wide-view-angle quarter-wave plate as one of the reference samples. In addition, an experimental tool is developed to implement the proposed method, which is of significant importance to quantify and improve the properties of the projection optics in lithography.",
keywords = "Calibration, Lithography, Mueller matrix, Polarization aberration",
author = "Yuanhe Li and Jianhui Li and Yanqiu Li and Guodong Zhou",
note = "Publisher Copyright: {\textcopyright} 2021 SPIE; 10th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced and Extreme Micro- Nano Manufacturing Technologies 2021 ; Conference date: 14-06-2021 Through 17-06-2021",
year = "2021",
doi = "10.1117/12.2604286",
language = "English",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
publisher = "SPIE",
editor = "Xiong Li and Xuan-Ming Duan and Mingbo Pu and Changtao Wang and Song Hu and Xiangang Luo",
booktitle = "10th International Symposium on Advanced Optical Manufacturing and Testing Technologies",
address = "United States",
}