Polarization aberration in-situ measurement in lithography tools

Yuanhe Li; Jianhui Li; Yanqiu Li; Guodong Zhou

doi:10.1117/12.2604286

Polarization aberration in-situ measurement in lithography tools

Yuanhe Li^*, Jianhui Li, Yanqiu Li, Guodong Zhou

^*此作品的通讯作者

光电学院

Beijing Institute of Technology

科研成果: 书/报告/会议事项章节 › 会议稿件 › 同行评审

2 引用（Scopus）

摘要

Polarization aberration of projection optics should be measured, controlled and compensated accurately in high numerical-aperture image optical system, such as lithography tools for technical node of 14-5 nm. In this paper, we develop a three-step eigenvalue calibration method for polarization aberration measurement in-situ accurately. The whole system and subsystems can be calibrated by using the wide-view-angle quarter-wave plate as one of the reference samples. In addition, an experimental tool is developed to implement the proposed method, which is of significant importance to quantify and improve the properties of the projection optics in lithography.

源语言	英语
主期刊名	10th International Symposium on Advanced Optical Manufacturing and Testing Technologies
主期刊副标题	Advanced and Extreme Micro- Nano Manufacturing Technologies
编辑	Xiong Li, Xuan-Ming Duan, Mingbo Pu, Changtao Wang, Song Hu, Xiangang Luo
出版商	SPIE
ISBN（电子版）	9781510650213
DOI	https://doi.org/10.1117/12.2604286
出版状态	已出版 - 2021
活动	10th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced and Extreme Micro- Nano Manufacturing Technologies 2021 - Chengdu, 中国期限: 14 6月 2021 → 17 6月 2021

出版系列

姓名	Proceedings of SPIE - The International Society for Optical Engineering
卷	12073
ISSN（印刷版）	0277-786X
ISSN（电子版）	1996-756X

会议

会议	10th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced and Extreme Micro- Nano Manufacturing Technologies 2021
国家/地区	中国
市	Chengdu
时期	14/06/21 → 17/06/21

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10.1117/12.2604286

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引用此

Li, Y., Li, J., Li, Y., & Zhou, G. (2021). Polarization aberration in-situ measurement in lithography tools. 在 X. Li, X.-M. Duan, M. Pu, C. Wang, S. Hu, & X. Luo (编辑), 10th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced and Extreme Micro- Nano Manufacturing Technologies 文章 120730O (Proceedings of SPIE - The International Society for Optical Engineering; 卷 12073). SPIE. https://doi.org/10.1117/12.2604286

Li, Yuanhe ; Li, Jianhui ; Li, Yanqiu 等. / Polarization aberration in-situ measurement in lithography tools. 10th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced and Extreme Micro- Nano Manufacturing Technologies. 编辑 / Xiong Li ; Xuan-Ming Duan ; Mingbo Pu ; Changtao Wang ; Song Hu ; Xiangang Luo. SPIE, 2021. (Proceedings of SPIE - The International Society for Optical Engineering).

@inproceedings{b2ee644316f647569d62c889af863325,

title = "Polarization aberration in-situ measurement in lithography tools",

abstract = "Polarization aberration of projection optics should be measured, controlled and compensated accurately in high numerical-aperture image optical system, such as lithography tools for technical node of 14-5 nm. In this paper, we develop a three-step eigenvalue calibration method for polarization aberration measurement in-situ accurately. The whole system and subsystems can be calibrated by using the wide-view-angle quarter-wave plate as one of the reference samples. In addition, an experimental tool is developed to implement the proposed method, which is of significant importance to quantify and improve the properties of the projection optics in lithography.",

keywords = "Calibration, Lithography, Mueller matrix, Polarization aberration",

author = "Yuanhe Li and Jianhui Li and Yanqiu Li and Guodong Zhou",

note = "Publisher Copyright: {\textcopyright} 2021 SPIE; 10th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced and Extreme Micro- Nano Manufacturing Technologies 2021 ; Conference date: 14-06-2021 Through 17-06-2021",

year = "2021",

doi = "10.1117/12.2604286",

language = "English",

series = "Proceedings of SPIE - The International Society for Optical Engineering",

publisher = "SPIE",

editor = "Xiong Li and Xuan-Ming Duan and Mingbo Pu and Changtao Wang and Song Hu and Xiangang Luo",

booktitle = "10th International Symposium on Advanced Optical Manufacturing and Testing Technologies",

address = "United States",

}

Li, Y, Li, J, Li, Y & Zhou, G 2021, Polarization aberration in-situ measurement in lithography tools. 在 X Li, X-M Duan, M Pu, C Wang, S Hu & X Luo (编辑), 10th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced and Extreme Micro- Nano Manufacturing Technologies., 120730O, Proceedings of SPIE - The International Society for Optical Engineering, 卷 12073, SPIE, 10th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced and Extreme Micro- Nano Manufacturing Technologies 2021, Chengdu, 中国, 14/06/21. https://doi.org/10.1117/12.2604286

Polarization aberration in-situ measurement in lithography tools. / Li, Yuanhe; Li, Jianhui; Li, Yanqiu 等.
10th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced and Extreme Micro- Nano Manufacturing Technologies. 编辑 / Xiong Li; Xuan-Ming Duan; Mingbo Pu; Changtao Wang; Song Hu; Xiangang Luo. SPIE, 2021. 120730O (Proceedings of SPIE - The International Society for Optical Engineering; 卷 12073).

科研成果: 书/报告/会议事项章节 › 会议稿件 › 同行评审

TY - GEN

T1 - Polarization aberration in-situ measurement in lithography tools

AU - Li, Yuanhe

AU - Li, Jianhui

AU - Li, Yanqiu

AU - Zhou, Guodong

PY - 2021

Y1 - 2021

N2 - Polarization aberration of projection optics should be measured, controlled and compensated accurately in high numerical-aperture image optical system, such as lithography tools for technical node of 14-5 nm. In this paper, we develop a three-step eigenvalue calibration method for polarization aberration measurement in-situ accurately. The whole system and subsystems can be calibrated by using the wide-view-angle quarter-wave plate as one of the reference samples. In addition, an experimental tool is developed to implement the proposed method, which is of significant importance to quantify and improve the properties of the projection optics in lithography.

AB - Polarization aberration of projection optics should be measured, controlled and compensated accurately in high numerical-aperture image optical system, such as lithography tools for technical node of 14-5 nm. In this paper, we develop a three-step eigenvalue calibration method for polarization aberration measurement in-situ accurately. The whole system and subsystems can be calibrated by using the wide-view-angle quarter-wave plate as one of the reference samples. In addition, an experimental tool is developed to implement the proposed method, which is of significant importance to quantify and improve the properties of the projection optics in lithography.

KW - Calibration

KW - Lithography

KW - Mueller matrix

KW - Polarization aberration

UR - http://www.scopus.com/inward/record.url?scp=85125010112&partnerID=8YFLogxK

U2 - 10.1117/12.2604286

DO - 10.1117/12.2604286

M3 - Conference contribution

AN - SCOPUS:85125010112

T3 - Proceedings of SPIE - The International Society for Optical Engineering

BT - 10th International Symposium on Advanced Optical Manufacturing and Testing Technologies

A2 - Li, Xiong

A2 - Duan, Xuan-Ming

A2 - Pu, Mingbo

A2 - Wang, Changtao

A2 - Hu, Song

A2 - Luo, Xiangang

PB - SPIE

T2 - 10th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced and Extreme Micro- Nano Manufacturing Technologies 2021

Y2 - 14 June 2021 through 17 June 2021

ER -

Li Y, Li J, Li Y, Zhou G. Polarization aberration in-situ measurement in lithography tools. 在 Li X, Duan XM, Pu M, Wang C, Hu S, Luo X, 编辑, 10th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced and Extreme Micro- Nano Manufacturing Technologies. SPIE. 2021. 120730O. (Proceedings of SPIE - The International Society for Optical Engineering). doi: 10.1117/12.2604286

Polarization aberration in-situ measurement in lithography tools

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