High-accuracy multi-step eigenvalue calibration method for Mueller matrix polarization imaging system

Jianhui Li, Yanqiu Li, Guodong Zhou, Jiazhi Wang, Meng Zheng, Ke Liu, Lihui Liu

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Mueller matrix polarization imaging system (MMPIS) is one of the most prospective tools that can provide a highresolution image of polarization properties for samples or systems. The MMPIS is composed of a laser source, polarization state generator (PSG), the sample, polarization state analyzer (PSA), a high-resolution imaging optics, collimating optics, and a CCD camera. Usually, the traditional eigenvalue calibration method (ECM) can be used to calibrate PSG and PSA. However, the imaging and collimating optics are not calibrated in MMPIS. For the highnumerical-aperture imaging system, the imaging and collimating optics can behave as polarization aberration modifying the tested sample's polarization properties leading to the erroneous judgment which affects the measurement accuracy of the MMPIS. In this paper, the multi-step eigenvalue calibration method (MECM) is explored to calibrate MMPIS. For the MECM applied to calibrate MMPIS, the calibration samples are required to place in different positions of the light path and the ECM is adopted in each position. In this way, the Mueller matrices of PSG and PSA, as well as the Mueller matrices of imaging optics and collimating optics can be obtained through calculation. To evaluate the measurement accuracy of MMPIS, the sample with known polarization properties such as air is measured. The experimental results show that before calibrating the imaging optics and collimating optics the measurement accuracy of MMPIS is 0.0124, while after the measurement accuracy has been improved to 0.0046, which is 62.90% better than before. The MECM can be used for the requirements of high accuracy measurement.

Original languageEnglish
Title of host publicationAOPC 2020
Subtitle of host publicationOptical Sensing and Imaging Technology
EditorsXiangang Luo, Yadong Jiang, Jin Lu, Dong Liu
PublisherSPIE
ISBN (Electronic)9781510639553
DOIs
Publication statusPublished - 2020
Event2020 Applied Optics and Photonics China: Optical Sensing and Imaging Technology, AOPC 2020 - Xiamen, China
Duration: 25 Aug 202027 Aug 2020

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume11567
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Conference

Conference2020 Applied Optics and Photonics China: Optical Sensing and Imaging Technology, AOPC 2020
Country/TerritoryChina
CityXiamen
Period25/08/2027/08/20

Keywords

  • calibration
  • polarimetric imaging
  • polarimetry
  • polarization

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