TY - GEN
T1 - High-accuracy multi-step eigenvalue calibration method for Mueller matrix polarization imaging system
AU - Li, Jianhui
AU - Li, Yanqiu
AU - Zhou, Guodong
AU - Wang, Jiazhi
AU - Zheng, Meng
AU - Liu, Ke
AU - Liu, Lihui
N1 - Publisher Copyright:
© 2020 SPIE.
PY - 2020
Y1 - 2020
N2 - Mueller matrix polarization imaging system (MMPIS) is one of the most prospective tools that can provide a highresolution image of polarization properties for samples or systems. The MMPIS is composed of a laser source, polarization state generator (PSG), the sample, polarization state analyzer (PSA), a high-resolution imaging optics, collimating optics, and a CCD camera. Usually, the traditional eigenvalue calibration method (ECM) can be used to calibrate PSG and PSA. However, the imaging and collimating optics are not calibrated in MMPIS. For the highnumerical-aperture imaging system, the imaging and collimating optics can behave as polarization aberration modifying the tested sample's polarization properties leading to the erroneous judgment which affects the measurement accuracy of the MMPIS. In this paper, the multi-step eigenvalue calibration method (MECM) is explored to calibrate MMPIS. For the MECM applied to calibrate MMPIS, the calibration samples are required to place in different positions of the light path and the ECM is adopted in each position. In this way, the Mueller matrices of PSG and PSA, as well as the Mueller matrices of imaging optics and collimating optics can be obtained through calculation. To evaluate the measurement accuracy of MMPIS, the sample with known polarization properties such as air is measured. The experimental results show that before calibrating the imaging optics and collimating optics the measurement accuracy of MMPIS is 0.0124, while after the measurement accuracy has been improved to 0.0046, which is 62.90% better than before. The MECM can be used for the requirements of high accuracy measurement.
AB - Mueller matrix polarization imaging system (MMPIS) is one of the most prospective tools that can provide a highresolution image of polarization properties for samples or systems. The MMPIS is composed of a laser source, polarization state generator (PSG), the sample, polarization state analyzer (PSA), a high-resolution imaging optics, collimating optics, and a CCD camera. Usually, the traditional eigenvalue calibration method (ECM) can be used to calibrate PSG and PSA. However, the imaging and collimating optics are not calibrated in MMPIS. For the highnumerical-aperture imaging system, the imaging and collimating optics can behave as polarization aberration modifying the tested sample's polarization properties leading to the erroneous judgment which affects the measurement accuracy of the MMPIS. In this paper, the multi-step eigenvalue calibration method (MECM) is explored to calibrate MMPIS. For the MECM applied to calibrate MMPIS, the calibration samples are required to place in different positions of the light path and the ECM is adopted in each position. In this way, the Mueller matrices of PSG and PSA, as well as the Mueller matrices of imaging optics and collimating optics can be obtained through calculation. To evaluate the measurement accuracy of MMPIS, the sample with known polarization properties such as air is measured. The experimental results show that before calibrating the imaging optics and collimating optics the measurement accuracy of MMPIS is 0.0124, while after the measurement accuracy has been improved to 0.0046, which is 62.90% better than before. The MECM can be used for the requirements of high accuracy measurement.
KW - calibration
KW - polarimetric imaging
KW - polarimetry
KW - polarization
UR - http://www.scopus.com/inward/record.url?scp=85097281771&partnerID=8YFLogxK
U2 - 10.1117/12.2580297
DO - 10.1117/12.2580297
M3 - Conference contribution
AN - SCOPUS:85097281771
T3 - Proceedings of SPIE - The International Society for Optical Engineering
BT - AOPC 2020
A2 - Luo, Xiangang
A2 - Jiang, Yadong
A2 - Lu, Jin
A2 - Liu, Dong
PB - SPIE
T2 - 2020 Applied Optics and Photonics China: Optical Sensing and Imaging Technology, AOPC 2020
Y2 - 25 August 2020 through 27 August 2020
ER -