TY - JOUR
T1 - Design an Extreme Ultraviolet Illumination System with High Uniformity
AU - Li, Yanqiu
AU - Hao, Qian
AU - Liu, Ke
AU - Yan, Xu
N1 - Publisher Copyright:
© OPTICS & PHOTONICS International 2021
PY - 2021
Y1 - 2021
N2 - In this paper, an illumination system matching an NA 0.33 projection objective is designed. The assignment of field facets and pupil facets under different illumination modes are obtained by the method based on combinatorial optimization. Results show that this illumination system can achieve high uniformity on the mask under different illumination modes. Key words: Extreme Ultraviolet Lithography, Illumination System.
AB - In this paper, an illumination system matching an NA 0.33 projection objective is designed. The assignment of field facets and pupil facets under different illumination modes are obtained by the method based on combinatorial optimization. Results show that this illumination system can achieve high uniformity on the mask under different illumination modes. Key words: Extreme Ultraviolet Lithography, Illumination System.
UR - http://www.scopus.com/inward/record.url?scp=85124393076&partnerID=8YFLogxK
M3 - Conference article
AN - SCOPUS:85124393076
SN - 0277-786X
VL - 11851
SP - 114
EP - 116
JO - Proceedings of SPIE - The International Society for Optical Engineering
JF - Proceedings of SPIE - The International Society for Optical Engineering
T2 - 10th Laser Display and Lighting Conference, LDC 2021
Y2 - 19 April 2021 through 22 April 2021
ER -