Abstract
In this paper, an illumination system matching an NA 0.33 projection objective is designed. The assignment of field facets and pupil facets under different illumination modes are obtained by the method based on combinatorial optimization. Results show that this illumination system can achieve high uniformity on the mask under different illumination modes. Key words: Extreme Ultraviolet Lithography, Illumination System.
Original language | English |
---|---|
Pages (from-to) | 114-116 |
Number of pages | 3 |
Journal | Proceedings of SPIE - The International Society for Optical Engineering |
Volume | 11851 |
Publication status | Published - 2021 |
Event | 10th Laser Display and Lighting Conference, LDC 2021 - Virtual, Online Duration: 19 Apr 2021 → 22 Apr 2021 |
Fingerprint
Dive into the research topics of 'Design an Extreme Ultraviolet Illumination System with High Uniformity'. Together they form a unique fingerprint.Cite this
Li, Y., Hao, Q., Liu, K., & Yan, X. (2021). Design an Extreme Ultraviolet Illumination System with High Uniformity. Proceedings of SPIE - The International Society for Optical Engineering, 11851, 114-116.