摘要
In this paper, an illumination system matching an NA 0.33 projection objective is designed. The assignment of field facets and pupil facets under different illumination modes are obtained by the method based on combinatorial optimization. Results show that this illumination system can achieve high uniformity on the mask under different illumination modes. Key words: Extreme Ultraviolet Lithography, Illumination System.
| 源语言 | 英语 |
|---|---|
| 页（从-至） | 114-116 |
| 页数 | 3 |
| 期刊 | Proceedings of SPIE - The International Society for Optical Engineering |
| 卷 | 11851 |
| 出版状态 | 已出版 - 2021 |
| 活动 | 10th Laser Display and Lighting Conference, LDC 2021 - Virtual, Online 期限: 19 4月 2021 → 22 4月 2021 |
指纹
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Li, Y., Hao, Q., Liu, K., & Yan, X. (2021). Design an Extreme Ultraviolet Illumination System with High Uniformity. Proceedings of SPIE - The International Society for Optical Engineering, 11851, 114-116.