AuCl3掺杂对碳纳米管晶体管的电学性能调控及特性分析

Translated title of the contribution: Modulation of electrical properties in carbon nanotube field-effect transistors through AuCl3 doping

Ming Xu Song, Huai Peng Wang, Yi Lin Sun*, Li Cai, Xiao Kuo Yang*, Dan Xie*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

Carbon nanotube-based field-effect transistors (CNFETs), as a new generation of nanodevices, are still difficult to apply to actual logic circuits due to the lack of a mature threshold voltage control mechanism. Here in this work, a feasible and large-scale processing surface doping method is demonstrated to effectively modulate the threshold voltage of CNFETs through the p-type doping effect of gold chloride (AuCl3). A comprehensive mapping from electrical parameters (Ion/Ioff, Vth and mobility) to doping concentration is carefully investigated, demonstrating a p-doping effect induced by surface charge transfer between Au3+ and carbon nanotube networks (CNTs). Threshold voltage of CNFETs can be effectively adjusted by varying the doping concentration. More importantly, the devices doped with low concentration AuCl3exhibit good electrical properties including greatly improved electrical conductivity, 2-3 times higher in mobility than intrinsic carbon nanotubes. Furthermore, the effects of annealing on the electrical properties of the AuCl3-doping CNFETs are studied, demonstrating that the p-type doping effect reaches the optimized state at a temperature of 50 ℃. Finally, first-principles calculation method is used to verify the doping control mechanism of Au3+to carbon nanotubes. This research provides important guidance for realizing large-area low-power logic circuits and high-performance electronic devices in the future.

Translated title of the contributionModulation of electrical properties in carbon nanotube field-effect transistors through AuCl3 doping
Original languageChinese (Traditional)
Article number238801
JournalWuli Xuebao/Acta Physica Sinica
Volume70
Issue number23
DOIs
Publication statusPublished - 5 Dec 2021

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