跳到主要导航
跳到搜索
跳到主要内容
北京理工大学 首页
English
中文
首页
师资队伍
研究单位
科研成果
奖项
按专业知识、名称或附属进行搜索
Fast inverse lithography approach based on a model-driven graph convolutional network
Shengen Zhang,
Xu Ma
*
, Junbi Zhang
*
此作品的通讯作者
光电学院
Beijing Institute of Technology
Huazhong University of Science and Technology
科研成果
:
期刊稿件
›
文章
›
同行评审
1
引用 (Scopus)
综述
指纹
指纹
探究 'Fast inverse lithography approach based on a model-driven graph convolutional network' 的科研主题。它们共同构成独一无二的指纹。
分类
加权
按字母排序
Engineering
Lithography
100%
Integrated Circuit
28%
Demonstrates
14%
Transmissions
14%
Computational Efficiency
14%
Optical Lithography
14%
Leading Edge
14%
Mask Pattern
14%
Graphics Processing Unit
14%
Geometric Feature
14%
Material Science
Lithography
100%
Electronic Circuit
28%
Optical Lithography
14%
Computer Science
Transmission Function
33%
Open Access Publishing
33%