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Fast inverse lithography approach based on a model-driven graph convolutional network
Shengen Zhang,
Xu Ma
*
, Junbi Zhang
*
Corresponding author for this work
School of Optics and Photonics
Beijing Institute of Technology
Huazhong University of Science and Technology
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peer-review
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Engineering
Lithography
100%
Integrated Circuit
28%
Demonstrates
14%
Transmissions
14%
Computational Efficiency
14%
Optical Lithography
14%
Leading Edge
14%
Mask Pattern
14%
Graphics Processing Unit
14%
Geometric Feature
14%
Material Science
Lithography
100%
Electronic Circuit
28%
Optical Lithography
14%
Computer Science
Transmission Function
33%
Open Access Publishing
33%