Two-step carrier-wave stitching method for aspheric and freeform surface measurement with a standard spherical interferometer

Qun Hao, Shaopu Wang, Yao Hu*, Yifeng Tan, Tengfei Li, Shanshan Wang

*Corresponding author for this work

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Abstract

Measurement of aspheric and freeform surfaces remains challenging due to the various shapes of the surface under test (SUT), especially when the SUT has a large aperture and strong deviation from the spherical surface. This paper proposes a two-step carrier-wave stitching method to enlarge the measurement bandwidth of a digital Moiré interferometry. Then, measurements of aspheric and freeform surfaces with a standard spherical interferometer without a phase-shifting mechanism are demonstrated. Experimental results with a root-mean-square repeatability of better than 1∕200λ present good consistency to UA3P contact measurement results. Further simulation results with different residual wavefronts confirm measurement accuracies of peak-to-valley value of 10−3λ. The method is effective for large residual wavefronts and thus has potential for flexible measurement of aspheric and freeform surfaces.

Original languageEnglish
Pages (from-to)4743-4750
Number of pages8
JournalApplied Optics
Volume57
Issue number17
DOIs
Publication statusPublished - 10 Jun 2018

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Hao, Q., Wang, S., Hu, Y., Tan, Y., Li, T., & Wang, S. (2018). Two-step carrier-wave stitching method for aspheric and freeform surface measurement with a standard spherical interferometer. Applied Optics, 57(17), 4743-4750. https://doi.org/10.1364/AO.57.004743