TY - GEN
T1 - The calculation and representation of polarization aberration induced by 3D mask in lithography simulation
AU - Hao, Yunyun
AU - Li, Yanqiu
AU - Li, Tie
AU - Sheng, Naiyuan
N1 - Publisher Copyright:
© 2017 SPIE.
PY - 2017
Y1 - 2017
N2 - With the continuous shrink of feature sizes, the 3D mask effects cannot be ignored in computational lithography. 3D mask effects inducing focus shift and scalar aberration like spherical aberration have been studied very well. To our knowledge, the polarization aberration (PA) including scalar aberration, retardance and diattenuation caused by 3D mask effects have not been paid attention to, which is very significant for computational lithography in advanced node. In this paper, we propose a novel approach to derive the PA induced by 3D mask effects from the diffraction frequency spectrum between the rigorous electromagnetic field model and the Kirchhoff model and express it as Jones matrix pupil. In addition, the physical decomposition of Jones matrix is adopted to obtain five physical properties of polarization aberration induced by 3D mask. Thus, the proposed method can fully, quantitatively, and clearly describe the PA induced by 3D mask.
AB - With the continuous shrink of feature sizes, the 3D mask effects cannot be ignored in computational lithography. 3D mask effects inducing focus shift and scalar aberration like spherical aberration have been studied very well. To our knowledge, the polarization aberration (PA) including scalar aberration, retardance and diattenuation caused by 3D mask effects have not been paid attention to, which is very significant for computational lithography in advanced node. In this paper, we propose a novel approach to derive the PA induced by 3D mask effects from the diffraction frequency spectrum between the rigorous electromagnetic field model and the Kirchhoff model and express it as Jones matrix pupil. In addition, the physical decomposition of Jones matrix is adopted to obtain five physical properties of polarization aberration induced by 3D mask. Thus, the proposed method can fully, quantitatively, and clearly describe the PA induced by 3D mask.
KW - 3D mask effects
KW - 45nm
KW - Computational lithography
KW - Diffraction spectrum
KW - Immersion lithography
KW - Jones pupil
KW - Physical decomposition
KW - Polarization aberration
UR - http://www.scopus.com/inward/record.url?scp=85040529363&partnerID=8YFLogxK
U2 - 10.1117/12.2285267
DO - 10.1117/12.2285267
M3 - Conference contribution
AN - SCOPUS:85040529363
T3 - Proceedings of SPIE - The International Society for Optical Engineering
BT - AOPC 2017
A2 - Zhou, Zhiping
A2 - Gu, Min
A2 - Yuan, Xiaocong
A2 - Qiu, Min
PB - SPIE
T2 - Applied Optics and Photonics China: Optoelectronics and Micro/Nano-Optics, AOPC 2017
Y2 - 4 June 2017 through 6 June 2017
ER -