Structural, compositional, and plasmonic characteristics of Ti–Zr ternary nitride thin films tuned by the nitrogen flow ratio in magnetron sputtering

Lianlian Chen, Yujing Ran, Zhaotan Jiang, Yinglan Li, Zhi Wang*

*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

10 Citations (Scopus)

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