Reduction of image optics dependence of resist image performance for high NA extreme ultraviolet lithography

Ouyang Chun, Yanqiu Li*, Lihui Liu

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

1 Citation (Scopus)

Fingerprint

Dive into the research topics of 'Reduction of image optics dependence of resist image performance for high NA extreme ultraviolet lithography'. Together they form a unique fingerprint.

Engineering

Medicine and Dentistry