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Plasmon-Induced Electron-Hole Separation at the Ag/TiO
2
(110) Interface
Jie Ma
*
, Shiwu Gao
*
Corresponding author for this work
School of Physics
China Academy of Engineering Physics
Research output
:
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Article
›
peer-review
50
Citations (Scopus)
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2
(110) Interface'. Together they form a unique fingerprint.
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Engineering
Nanoclusters
100%
Hot Electron
100%
Plasmon Excitation
100%
Couplings
50%
Determines
50%
Photovoltaics
50%
Optoelectronics
50%
Plasmonics
50%
Surface Plasmon
50%
Interfacial Layer
50%
Charge Injection
50%
Hole Pair
50%
Induced Charge
50%
Net Charge
50%
Material Science
Titanium Dioxide
100%
Nanoclusters
66%
Hot Electron
66%
Density
33%
Optoelectronics
33%
Photovoltaics
33%
Surface Plasmon
33%
Hot Carrier
33%
Liquid Sloshing
33%