Photosensitive ZrO                         2                          suspensions for stereolithography

Keqiang Zhang; Rujie He; Chen Xie; Gang Wang; Guojiao Ding; Min Wang; Weidong Song; Daining Fang

doi:10.1016/j.ceramint.2019.03.123

Photosensitive ZrO ₂ suspensions for stereolithography

Keqiang Zhang, Rujie He^*, Chen Xie, Gang Wang, Guojiao Ding, Min Wang, Weidong Song, Daining Fang

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

117 Citations (Scopus)

Abstract

In this work, high solid loading, low viscosity photosensitive ZrO ₂ suspensions with optimized rheological properties for stereolithography based additive manufacturing was developed. The influence of dispersant types, concentrations and solid loading on their dispersion behavior and rheological behavior were studied. In addition, the dispersion mechanism and suspension stability were also characterized. The optimal dispersant and concentration for the suspension with 40 vol% solid loading were KO110 and 2 wt%, respectively. These results revealed that the ZrO ₂ suspensions presented near-fluid behavior, which was close to Newtonian flow, resulting in a low viscosity and stability for stereolithography based additive manufacturing. A photosensitive ZrO ₂ suspension with a high solid loading of 55 vol% and a low viscosity of 1.65 Pa s at the shear rate of 200 s ⁻¹ was achieved when the dispersant and concentration were KOS110 and 2 wt%, respectively.

Original language	English
Pages (from-to)	12189-12195
Number of pages	7
Journal	Ceramics International
Volume	45
Issue number	9
DOIs	https://doi.org/10.1016/j.ceramint.2019.03.123
Publication status	Published - 15 Jun 2019

Keywords

Dispersion
Rheological behavior
Solid loading
Stereolithography

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10.1016/j.ceramint.2019.03.123

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@article{105456fa31b6469cbe47570d162d1265,

title = " Photosensitive ZrO 2 suspensions for stereolithography ",

abstract = " In this work, high solid loading, low viscosity photosensitive ZrO 2 suspensions with optimized rheological properties for stereolithography based additive manufacturing was developed. The influence of dispersant types, concentrations and solid loading on their dispersion behavior and rheological behavior were studied. In addition, the dispersion mechanism and suspension stability were also characterized. The optimal dispersant and concentration for the suspension with 40 vol% solid loading were KO110 and 2 wt%, respectively. These results revealed that the ZrO 2 suspensions presented near-fluid behavior, which was close to Newtonian flow, resulting in a low viscosity and stability for stereolithography based additive manufacturing. A photosensitive ZrO 2 suspension with a high solid loading of 55 vol% and a low viscosity of 1.65 Pa s at the shear rate of 200 s −1 was achieved when the dispersant and concentration were KOS110 and 2 wt%, respectively.",

keywords = "Dispersion, Rheological behavior, Solid loading, Stereolithography",

author = "Keqiang Zhang and Rujie He and Chen Xie and Gang Wang and Guojiao Ding and Min Wang and Weidong Song and Daining Fang",

note = "Publisher Copyright: {\textcopyright} 2019 Elsevier Ltd and Techna Group S.r.l.",

year = "2019",

month = jun,

day = "15",

doi = "10.1016/j.ceramint.2019.03.123",

language = "English",

volume = "45",

pages = "12189--12195",

journal = "Ceramics International",

issn = "0272-8842",

publisher = "Elsevier Ltd.",

number = "9",

}

TY - JOUR

T1 - Photosensitive ZrO 2 suspensions for stereolithography

AU - Zhang, Keqiang

AU - He, Rujie

AU - Xie, Chen

AU - Wang, Gang

AU - Ding, Guojiao

AU - Wang, Min

AU - Song, Weidong

AU - Fang, Daining

PY - 2019/6/15

Y1 - 2019/6/15

N2 - In this work, high solid loading, low viscosity photosensitive ZrO 2 suspensions with optimized rheological properties for stereolithography based additive manufacturing was developed. The influence of dispersant types, concentrations and solid loading on their dispersion behavior and rheological behavior were studied. In addition, the dispersion mechanism and suspension stability were also characterized. The optimal dispersant and concentration for the suspension with 40 vol% solid loading were KO110 and 2 wt%, respectively. These results revealed that the ZrO 2 suspensions presented near-fluid behavior, which was close to Newtonian flow, resulting in a low viscosity and stability for stereolithography based additive manufacturing. A photosensitive ZrO 2 suspension with a high solid loading of 55 vol% and a low viscosity of 1.65 Pa s at the shear rate of 200 s −1 was achieved when the dispersant and concentration were KOS110 and 2 wt%, respectively.

AB - In this work, high solid loading, low viscosity photosensitive ZrO 2 suspensions with optimized rheological properties for stereolithography based additive manufacturing was developed. The influence of dispersant types, concentrations and solid loading on their dispersion behavior and rheological behavior were studied. In addition, the dispersion mechanism and suspension stability were also characterized. The optimal dispersant and concentration for the suspension with 40 vol% solid loading were KO110 and 2 wt%, respectively. These results revealed that the ZrO 2 suspensions presented near-fluid behavior, which was close to Newtonian flow, resulting in a low viscosity and stability for stereolithography based additive manufacturing. A photosensitive ZrO 2 suspension with a high solid loading of 55 vol% and a low viscosity of 1.65 Pa s at the shear rate of 200 s −1 was achieved when the dispersant and concentration were KOS110 and 2 wt%, respectively.

KW - Dispersion

KW - Rheological behavior

KW - Solid loading

KW - Stereolithography

UR - http://www.scopus.com/inward/record.url?scp=85063254339&partnerID=8YFLogxK

U2 - 10.1016/j.ceramint.2019.03.123

DO - 10.1016/j.ceramint.2019.03.123

M3 - Article

AN - SCOPUS:85063254339

SN - 0272-8842

VL - 45

SP - 12189

EP - 12195

JO - Ceramics International

JF - Ceramics International

IS - 9

ER -

Photosensitive ZrO ₂ suspensions for stereolithography

Abstract

Keywords

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