Option of resolution enhancement technology in advanced lithography

Li Yanqiu*, Zhou Yuan

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

4 Citations (Scopus)

Abstract

Hyper-numerical aperture ArF scanner has being designed to meet the needs of 45nm node. Resolution enhancement technology, such as phase shift mask, off-axis illumination, and innovation processing technology must be employed in hyper-numerical aperture ArF lithography. However the cross talk of phase shift mask, off axis illumination, polarization effect, and resist stack impacts lithography performance significantly. Option of resolution enhancement technology is presented in conjunction with optimal dual-layers bottom anti-refactive coating and polarized illumination by our program and Prolith 9.0. Multi options of resolution enhancement technology are obtained to maintain a small CD, good CD uniformity (CDU), reasonable process window (PW) and fidelity of resist profile.

Original languageEnglish
Title of host publication3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies
Subtitle of host publicationDesign, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems
DOIs
Publication statusPublished - 2007
Event3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies, AOMATT 2007: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems - Chengdu, China
Duration: 8 Jul 200712 Jul 2007

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume6724
ISSN (Print)0277-786X

Conference

Conference3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies, AOMATT 2007: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems
Country/TerritoryChina
CityChengdu
Period8/07/0712/07/07

Keywords

  • Antireflective coatings
  • ArF lithography
  • Polarization
  • Resolution enhancement technology

Fingerprint

Dive into the research topics of 'Option of resolution enhancement technology in advanced lithography'. Together they form a unique fingerprint.

Cite this

Yanqiu, L., & Yuan, Z. (2007). Option of resolution enhancement technology in advanced lithography. In 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems Article 67240G (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 6724). https://doi.org/10.1117/12.782511