Novel way of measuring the multilayer reflectivity utilizing the symmetrical output of XRL in plasma

Tao Cheng*, Wen Zhong Huang, Li Min Meng, Ying Jun Li, Jing Zhao, Jie Zhang

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

A novel way of measuring the reflectivity of multilayer was proposed. Utilizing the symmetrical output of the X-ray laser in slab laser-plasma, the reflectivity could be conveniently obtained in this way. It was also given the setup parameters by calculation according to the demand of precise considering the absorption of X-ray laser by plasma. Under which an experiment of measuring the reflectivity of Mo/Si and Mo/Mg was carried out.

Original languageEnglish
Pages (from-to)2288-2291
Number of pages4
JournalGuangzi Xuebao/Acta Photonica Sinica
Volume37
Issue number11
Publication statusPublished - Nov 2008
Externally publishedYes

Keywords

  • Absorption
  • Multilayers
  • Plasma
  • Reflectivity
  • X-ray laser

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Cheng, T., Huang, W. Z., Meng, L. M., Li, Y. J., Zhao, J., & Zhang, J. (2008). Novel way of measuring the multilayer reflectivity utilizing the symmetrical output of XRL in plasma. Guangzi Xuebao/Acta Photonica Sinica, 37(11), 2288-2291.