Molecular beam epitaxy growth of topological insulator Bi4Br4 on silicon for the infrared applications

Shiqi Xu, Xiangkai Meng, Xu Zhang, Chunpan Zhang, Jiangyue Bai, Yujiu Jiang, Xiuxia Li, Chong Wang*, Pengcheng Mao*, Junfeng Han*, Yugui Yao

*Corresponding author for this work

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