Effects of assisting and sputtering ion current on ion beam assisted deposition textured yttria stabilized zirconia buffer layers of coated conductors

Biaxially textured yttria stabilized zirconia (0 0 1) thin films were fabricated on untextured hastelloy substrates by ion beam assisted deposition method. The effects of assisting beam current density J _a and sputtering beam current density J _s on the textures of the films were studied. The results indicate that as J _a or J _s increase, both the out-of-plane and the in-plane textures are improved initially, and then degrade. The results can be attributed to anisotropic damage and selective sputtering effect of assisting ions. At the same ion-to-atom arrival ratio r, which is reflected with J _a /J _s value, lower deposition rate can enhance the biaxial texture.