Discharge and Deposition Characteristics of High-Power Impulse Magnetron Sputtering Using Various Target Materials

Bocong Zheng, Zhongzhen Wu*, Suihan Cui, Shu Xiao, Liangliang Liu, Hai Lin, Ricky K.Y. Fu, Xiubo Tian, Feng Pan, Paul K. Chu

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

14 Citations (Scopus)

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