Development of laser produced plasma source for EUV lithography

Fu Chang Zhang*, Yan Qiu Li

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

5 Citations (Scopus)

Abstract

The production of extreme ultraviolet (EUV) was introduced. Simultaneously, the development of the laser produced plasma (LPP) sources was systemically described and the last development of Cymer's LPP sources for EUV lithography was reviewed in detail. Finally, a summary was given and some prospects for EUV source research were proposed.

Original languageEnglish
Pages (from-to)1-7+12
JournalWeixi Jiagong Jishu/Microfabrication Technology
Issue number5
Publication statusPublished - Oct 2006
Externally publishedYes

Keywords

  • Debris contamination
  • EUV lithography
  • EUV power
  • LPP

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Zhang, F. C., & Li, Y. Q. (2006). Development of laser produced plasma source for EUV lithography. Weixi Jiagong Jishu/Microfabrication Technology, (5), 1-7+12.