Abstract
The production of extreme ultraviolet (EUV) was introduced. Simultaneously, the development of the laser produced plasma (LPP) sources was systemically described and the last development of Cymer's LPP sources for EUV lithography was reviewed in detail. Finally, a summary was given and some prospects for EUV source research were proposed.
Original language | English |
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Pages (from-to) | 1-7+12 |
Journal | Weixi Jiagong Jishu/Microfabrication Technology |
Issue number | 5 |
Publication status | Published - Oct 2006 |
Externally published | Yes |
Keywords
- Debris contamination
- EUV lithography
- EUV power
- LPP
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Zhang, F. C., & Li, Y. Q. (2006). Development of laser produced plasma source for EUV lithography. Weixi Jiagong Jishu/Microfabrication Technology, (5), 1-7+12.