Crystallographically tilted and partially strain relaxed GaN grown on inclined {111} facets etched on Si(100) substrate

K. K.Ansah Antwi, C. B. Soh, Q. Wee, Rayson J.N. Tan, P. Yang, H. R. Tan, L. F. Sun, Z. X. Shen, S. J. Chua*

*Corresponding author for this work

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