The annealing process of R.F. magnetron sputtered ZnO:Al films

Zhinong Yu*, Jin Xu, Wei Xue, Jinwei Li

*此作品的通讯作者

科研成果: 书/报告/会议事项章节会议稿件同行评审

摘要

The ZnO:Al films were annealed at different atmosphere. The films annealed in vacuum showed perfect properties, compared with in air and Ar atmosphere, and the low resistivity of the order of 10-3 Ω·cm was obtained in the condition of vacuum annealing at 220 °C.

源语言英语
主期刊名2007 Asia Optical Fiber Communication and Optoelectronic Exposition and Conference, AOE
552-554
页数3
DOI
出版状态已出版 - 2007
活动2007 Asia Optical Fiber Communication and Optoelectronic Exposition and Conference, AOE - Shanghai, 中国
期限: 17 10月 200719 10月 2007

出版系列

姓名2007 Asia Optical Fiber Communication and Optoelectronic Exposition and Conference, AOE

会议

会议2007 Asia Optical Fiber Communication and Optoelectronic Exposition and Conference, AOE
国家/地区中国
Shanghai
时期17/10/0719/10/07

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引用此

Yu, Z., Xu, J., Xue, W., & Li, J. (2007). The annealing process of R.F. magnetron sputtered ZnO:Al films. 在 2007 Asia Optical Fiber Communication and Optoelectronic Exposition and Conference, AOE (页码 552-554). 文章 4410872 (2007 Asia Optical Fiber Communication and Optoelectronic Exposition and Conference, AOE). https://doi.org/10.1109/AOE.2007.4410872