Silicon-based integrated wobble micromotor

Xiqing Sun*, Huikai Xie, Litian Liu, Zhijian Li, Peixin Qian

*此作品的通讯作者

科研成果: 期刊稿件文章同行评审

摘要

A silicon-based integrated wobble micromotor has been successfully fabricated. The manufacturing process for this motor is very simple, including four photolithography steps, two for polysilicon films by LPCVD and two for silicon dioxide films by LTO. Both rotor and stator for this motor are formed from polysilicon films of 4.2 μm thick. The rotor-stator air gaps are 2.0-2.5 μm, the rotor diameters are 40-50 μm. The initial test results show that the minimum driving voltage is 49 V and the maximum rotational speed is about 600 rpm.

源语言英语
页(从-至)149-152
页数4
期刊Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors
16
2
出版状态已出版 - 2月 1995
已对外发布

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引用此

Sun, X., Xie, H., Liu, L., Li, Z., & Qian, P. (1995). Silicon-based integrated wobble micromotor. Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors, 16(2), 149-152.