Abstract
A silicon-based integrated wobble micromotor has been successfully fabricated. The manufacturing process for this motor is very simple, including four photolithography steps, two for polysilicon films by LPCVD and two for silicon dioxide films by LTO. Both rotor and stator for this motor are formed from polysilicon films of 4.2 μm thick. The rotor-stator air gaps are 2.0-2.5 μm, the rotor diameters are 40-50 μm. The initial test results show that the minimum driving voltage is 49 V and the maximum rotational speed is about 600 rpm.
| Original language | English |
|---|---|
| Pages (from-to) | 149-152 |
| Number of pages | 4 |
| Journal | Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors |
| Volume | 16 |
| Issue number | 2 |
| Publication status | Published - Feb 1995 |
| Externally published | Yes |