Proportion quantitative analysis and etching of {110} planes on tungsten single crystal coating surface

Rende Mu*, Chengwen Tan, Xiaodong Yu

*此作品的通讯作者

科研成果: 期刊稿件文章同行评审

8 引用 (Scopus)

摘要

Tungsten single crystal and poly crystal were treated by electrolytic etching in a 3% by weight solution of NaOH in distilled water. The method for determining the proportion of {110} planes and characteristic morphology on the coating surface after electrolytic etching were investigated using EBSD and auto-focusing microscope. Then the optimization of process parameters for electrolytic etching is achieved. In order to compare the effect of process parameters, three process parameters were selected for the tungsten single crystal electrolytic etching. Through analyzing the change of {110} planes' proportion, we found that when the coatings are etched with 1.4 amp/cm2 and 3 min, {110} planes can be exposed in the greatest degree that can reach 61.4% on tubular surfaces. The proposed approach greatly improves the proportion of {110} planes relative to the original surface.

源语言英语
页(从-至)71-76
页数6
期刊Journal of Alloys and Compounds
666
DOI
出版状态已出版 - 5 5月 2016

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