Proportion quantitative analysis and etching of {110} planes on tungsten single crystal coating surface

Rende Mu; Chengwen Tan; Xiaodong Yu

doi:10.1016/j.jallcom.2016.01.129

Proportion quantitative analysis and etching of {110} planes on tungsten single crystal coating surface

Rende Mu^*, Chengwen Tan, Xiaodong Yu

^*Corresponding author for this work

School of Material Science and Engineering

Beijing Institute of Aeronautical Materials

Research output: Contribution to journal › Article › peer-review

8 Citations (Scopus)

Abstract

Tungsten single crystal and poly crystal were treated by electrolytic etching in a 3% by weight solution of NaOH in distilled water. The method for determining the proportion of {110} planes and characteristic morphology on the coating surface after electrolytic etching were investigated using EBSD and auto-focusing microscope. Then the optimization of process parameters for electrolytic etching is achieved. In order to compare the effect of process parameters, three process parameters were selected for the tungsten single crystal electrolytic etching. Through analyzing the change of {110} planes' proportion, we found that when the coatings are etched with 1.4 amp/cm² and 3 min, {110} planes can be exposed in the greatest degree that can reach 61.4% on tubular surfaces. The proposed approach greatly improves the proportion of {110} planes relative to the original surface.

Original language	English
Pages (from-to)	71-76
Number of pages	6
Journal	Journal of Alloys and Compounds
Volume	666
DOIs	https://doi.org/10.1016/j.jallcom.2016.01.129
Publication status	Published - 5 May 2016

Keywords

CVD tungsten
Electrolytic etching
Quantitative statistics
{110} planes

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10.1016/j.jallcom.2016.01.129

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title = "Proportion quantitative analysis and etching of {110} planes on tungsten single crystal coating surface",

abstract = "Tungsten single crystal and poly crystal were treated by electrolytic etching in a 3% by weight solution of NaOH in distilled water. The method for determining the proportion of {110} planes and characteristic morphology on the coating surface after electrolytic etching were investigated using EBSD and auto-focusing microscope. Then the optimization of process parameters for electrolytic etching is achieved. In order to compare the effect of process parameters, three process parameters were selected for the tungsten single crystal electrolytic etching. Through analyzing the change of {110} planes' proportion, we found that when the coatings are etched with 1.4 amp/cm2 and 3 min, {110} planes can be exposed in the greatest degree that can reach 61.4% on tubular surfaces. The proposed approach greatly improves the proportion of {110} planes relative to the original surface.",

keywords = "CVD tungsten, Electrolytic etching, Quantitative statistics, {110} planes",

author = "Rende Mu and Chengwen Tan and Xiaodong Yu",

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T1 - Proportion quantitative analysis and etching of {110} planes on tungsten single crystal coating surface

AU - Mu, Rende

AU - Tan, Chengwen

AU - Yu, Xiaodong

PY - 2016/5/5

Y1 - 2016/5/5

N2 - Tungsten single crystal and poly crystal were treated by electrolytic etching in a 3% by weight solution of NaOH in distilled water. The method for determining the proportion of {110} planes and characteristic morphology on the coating surface after electrolytic etching were investigated using EBSD and auto-focusing microscope. Then the optimization of process parameters for electrolytic etching is achieved. In order to compare the effect of process parameters, three process parameters were selected for the tungsten single crystal electrolytic etching. Through analyzing the change of {110} planes' proportion, we found that when the coatings are etched with 1.4 amp/cm2 and 3 min, {110} planes can be exposed in the greatest degree that can reach 61.4% on tubular surfaces. The proposed approach greatly improves the proportion of {110} planes relative to the original surface.

AB - Tungsten single crystal and poly crystal were treated by electrolytic etching in a 3% by weight solution of NaOH in distilled water. The method for determining the proportion of {110} planes and characteristic morphology on the coating surface after electrolytic etching were investigated using EBSD and auto-focusing microscope. Then the optimization of process parameters for electrolytic etching is achieved. In order to compare the effect of process parameters, three process parameters were selected for the tungsten single crystal electrolytic etching. Through analyzing the change of {110} planes' proportion, we found that when the coatings are etched with 1.4 amp/cm2 and 3 min, {110} planes can be exposed in the greatest degree that can reach 61.4% on tubular surfaces. The proposed approach greatly improves the proportion of {110} planes relative to the original surface.

KW - CVD tungsten

KW - Electrolytic etching

KW - Quantitative statistics

KW - {110} planes

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VL - 666

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EP - 76

JO - Journal of Alloys and Compounds

JF - Journal of Alloys and Compounds

ER -

Proportion quantitative analysis and etching of {110} planes on tungsten single crystal coating surface

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