Photoluminescence from magnetron sputtered SiO2 films Co-doped with (Er, Ge) under excitation of a 325 nm He-Cd laser line

C. L. Heng, O. H.Y. Zalloum, E. Chelomentsev, P. Mascher

科研成果: 书/报告/会议事项章节会议稿件同行评审

2 引用 (Scopus)

摘要

We have studied photoluminescence (PL) from SiO2 films codoped with (Er, Ge) deposited by magnetron sputtering of an Er+Ge+SiO2 composite target in pure Ar ambient. Under excitation of a 325 nm He-Cd laser line, blue emission bands around 400 nm and near infrared bands around 800 nm have been observed, which are attributed to Ge-related defects and Ge nanoclusters (Ge-ncls), respectively. Strong Er3+ PL at 1.54 μm was also observed from the films, while the Er PL intensity of a control Er-doped SiO2 film (i.e., without Ge), is negligible under the same excitation. All the PL intensities vary as functions of thermal annealing temperatures. The results demonstrate that the significant enhancement of Er PL in the (Er, Ge) co-doped SiO2 films are due to the incorporation of Ge. The roles of Ge-ncls and Ge-related defects to the Er3+ excitation are discussed.

源语言英语
主期刊名ECS Transactions - Symposium on Silicon Nitride, Silicon Dioxide Thin Insulating Films, and Emerging Dielectrics
出版商Electrochemical Society Inc.
549-559
页数11
版本3
ISBN(电子版)9781566775526
ISBN(印刷版)9781566775526
DOI
出版状态已出版 - 2007
已对外发布
活动Symposium on Silicon Nitride, Silicon Dioxide Thin Insulating Films, and Emerging Dielectrics - 211th ECS Meeting - Chicago, IL, 美国
期限: 6 5月 200711 5月 2007

出版系列

姓名ECS Transactions
编号3
6
ISSN(印刷版)1938-5862
ISSN(电子版)1938-6737

会议

会议Symposium on Silicon Nitride, Silicon Dioxide Thin Insulating Films, and Emerging Dielectrics - 211th ECS Meeting
国家/地区美国
Chicago, IL
时期6/05/0711/05/07

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