NbF5前驱体化学气相沉积铌涂层的生长动力学

Mingmin Zheng; Chengwen Tan; Xiaodong Yu; Ying Li; Honglei Ma

NbF₅前驱体化学气相沉积铌涂层的生长动力学

Mingmin Zheng, Chengwen Tan, Xiaodong Yu^*, Ying Li, Honglei Ma

^*此作品的通讯作者

材料学院

科研成果: 期刊稿件 › 文章 › 同行评审

摘要

Dense niobium coating was prepared by atmospheric pressure chemical vapor deposition (CVD) at 1150℃, and the deposition rate reached 250 μm/h. The post-deposition coating thickness was analyzed along the gas flow direction, and the mole percentage of NbF₅, H₂, HF and Ar at different positions were determined. Finally we obtained a growth kinetics equation by data fitting, which agrees well with the experimental results. Further analysis of the kinetic equations reveals that the byproduct HF has a great impact on deposition rate while Ar almost has no effect.

投稿的翻译标题	Growth Kinetics of Niobium Coating Prepared by CVD from NbF₅
源语言	繁体中文
页（从-至）	187-190
页数	4
期刊	Xiyou Jinshu Cailiao Yu Gongcheng/Rare Metal Materials and Engineering
卷	47
期	1
出版状态	已出版 - 1 1月 2018

关键词

Byproducts
Chemical vapor deposition
Growth kinetics
Niobium coating

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引用此

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title = "NbF5前驱体化学气相沉积铌涂层的生长动力学",

abstract = "Dense niobium coating was prepared by atmospheric pressure chemical vapor deposition (CVD) at 1150℃, and the deposition rate reached 250 μm/h. The post-deposition coating thickness was analyzed along the gas flow direction, and the mole percentage of NbF5, H2, HF and Ar at different positions were determined. Finally we obtained a growth kinetics equation by data fitting, which agrees well with the experimental results. Further analysis of the kinetic equations reveals that the byproduct HF has a great impact on deposition rate while Ar almost has no effect.",

keywords = "Byproducts, Chemical vapor deposition, Growth kinetics, Niobium coating",

author = "Mingmin Zheng and Chengwen Tan and Xiaodong Yu and Ying Li and Honglei Ma",

year = "2018",

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language = "繁体中文",

volume = "47",

pages = "187--190",

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TY - JOUR

T1 - NbF5前驱体化学气相沉积铌涂层的生长动力学

AU - Zheng, Mingmin

AU - Tan, Chengwen

AU - Yu, Xiaodong

AU - Li, Ying

AU - Ma, Honglei

PY - 2018/1/1

Y1 - 2018/1/1

N2 - Dense niobium coating was prepared by atmospheric pressure chemical vapor deposition (CVD) at 1150℃, and the deposition rate reached 250 μm/h. The post-deposition coating thickness was analyzed along the gas flow direction, and the mole percentage of NbF5, H2, HF and Ar at different positions were determined. Finally we obtained a growth kinetics equation by data fitting, which agrees well with the experimental results. Further analysis of the kinetic equations reveals that the byproduct HF has a great impact on deposition rate while Ar almost has no effect.

AB - Dense niobium coating was prepared by atmospheric pressure chemical vapor deposition (CVD) at 1150℃, and the deposition rate reached 250 μm/h. The post-deposition coating thickness was analyzed along the gas flow direction, and the mole percentage of NbF5, H2, HF and Ar at different positions were determined. Finally we obtained a growth kinetics equation by data fitting, which agrees well with the experimental results. Further analysis of the kinetic equations reveals that the byproduct HF has a great impact on deposition rate while Ar almost has no effect.

KW - Byproducts

KW - Chemical vapor deposition

KW - Growth kinetics

KW - Niobium coating

UR - http://www.scopus.com/inward/record.url?scp=85052691785&partnerID=8YFLogxK

M3 - 文章

AN - SCOPUS:85052691785

SN - 1002-185X

VL - 47

SP - 187

EP - 190

JO - Xiyou Jinshu Cailiao Yu Gongcheng/Rare Metal Materials and Engineering

JF - Xiyou Jinshu Cailiao Yu Gongcheng/Rare Metal Materials and Engineering

IS - 1

ER -

NbF5前驱体化学气相沉积铌涂层的生长动力学

摘要

关键词

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NbF₅前驱体化学气相沉积铌涂层的生长动力学