Abstract
Dense niobium coating was prepared by atmospheric pressure chemical vapor deposition (CVD) at 1150℃, and the deposition rate reached 250 μm/h. The post-deposition coating thickness was analyzed along the gas flow direction, and the mole percentage of NbF5, H2, HF and Ar at different positions were determined. Finally we obtained a growth kinetics equation by data fitting, which agrees well with the experimental results. Further analysis of the kinetic equations reveals that the byproduct HF has a great impact on deposition rate while Ar almost has no effect.
Translated title of the contribution | Growth Kinetics of Niobium Coating Prepared by CVD from NbF5 |
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Original language | Chinese (Traditional) |
Pages (from-to) | 187-190 |
Number of pages | 4 |
Journal | Xiyou Jinshu Cailiao Yu Gongcheng/Rare Metal Materials and Engineering |
Volume | 47 |
Issue number | 1 |
Publication status | Published - 1 Jan 2018 |