NbF5前驱体化学气相沉积铌涂层的生长动力学

Translated title of the contribution: Growth Kinetics of Niobium Coating Prepared by CVD from NbF5

Mingmin Zheng, Chengwen Tan, Xiaodong Yu*, Ying Li, Honglei Ma

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

Dense niobium coating was prepared by atmospheric pressure chemical vapor deposition (CVD) at 1150℃, and the deposition rate reached 250 μm/h. The post-deposition coating thickness was analyzed along the gas flow direction, and the mole percentage of NbF5, H2, HF and Ar at different positions were determined. Finally we obtained a growth kinetics equation by data fitting, which agrees well with the experimental results. Further analysis of the kinetic equations reveals that the byproduct HF has a great impact on deposition rate while Ar almost has no effect.

Translated title of the contributionGrowth Kinetics of Niobium Coating Prepared by CVD from NbF5
Original languageChinese (Traditional)
Pages (from-to)187-190
Number of pages4
JournalXiyou Jinshu Cailiao Yu Gongcheng/Rare Metal Materials and Engineering
Volume47
Issue number1
Publication statusPublished - 1 Jan 2018

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