TY - JOUR
T1 - Electrical characteristics of a novel interposer technique using ultra-low-resistivity silicon-pillars with polymer insulation as TSVs
AU - Wang, Weijiang
AU - Yan, Yangyang
AU - Ding, Yingtao
AU - Wang, Shiwei
AU - Wang, Weimin
AU - Sun, Yipeng
AU - Chen, Qianwen
N1 - Publisher Copyright:
© 2014 Elsevier B.V. All rights reserved.
PY - 2015
Y1 - 2015
N2 - In this paper, a novel silicon interposer technique using silicon pillars with ultra-low-resistivity as the conductor while polymer Benzocyclobutene (BCB) as liner layer is proposed. Fabrication flow of the proposed interposer structure is developed and implemented. Electrical performances, including transmißion performance and signal distortion characteristics, are investigated and presented using 3D full wave simulator and SPICE type circuit simulator such as ANSYS's HFß software and Agilent's ADS software, respectively. The impacts of geometric parameters and resistivity of silicon substrate on electrical characterizations are investigated in both frequency domain and time domain. Results show that the proposed interposer has comparable electrical performances such as return loß and insertion loß with conventional Cu-based through-silicon-via (TSV) structure in frequency region from 0.1 GHz to 10 GHz, despite of slight degradation at low frequency, but it involves a much simpler and more feasible proceß flow compared with the latter technique.
AB - In this paper, a novel silicon interposer technique using silicon pillars with ultra-low-resistivity as the conductor while polymer Benzocyclobutene (BCB) as liner layer is proposed. Fabrication flow of the proposed interposer structure is developed and implemented. Electrical performances, including transmißion performance and signal distortion characteristics, are investigated and presented using 3D full wave simulator and SPICE type circuit simulator such as ANSYS's HFß software and Agilent's ADS software, respectively. The impacts of geometric parameters and resistivity of silicon substrate on electrical characterizations are investigated in both frequency domain and time domain. Results show that the proposed interposer has comparable electrical performances such as return loß and insertion loß with conventional Cu-based through-silicon-via (TSV) structure in frequency region from 0.1 GHz to 10 GHz, despite of slight degradation at low frequency, but it involves a much simpler and more feasible proceß flow compared with the latter technique.
KW - Benzocyclobutene (BCB)
KW - Interposer technique
KW - Through-silicon-vias (TSVs)
KW - Ultra-low-resistivity
UR - http://www.scopus.com/inward/record.url?scp=85027928919&partnerID=8YFLogxK
U2 - 10.1016/j.mee.2014.12.009
DO - 10.1016/j.mee.2014.12.009
M3 - Article
AN - SCOPUS:85027928919
SN - 0167-9317
VL - 137
SP - 146
EP - 152
JO - Microelectronic Engineering
JF - Microelectronic Engineering
IS - 1
ER -