Effects of SiO2 buffer layer on the characteristics of flexible ITO films

Zhinong Yu*, Longfeng Xiang, Yuqiong Li, Wei Xue

*此作品的通讯作者

科研成果: 期刊稿件文章同行评审

4 引用 (Scopus)

摘要

The flexible ITO films were fabricated on PET substrate by Ion Beam Assisted Deposition(IBAD), and the effects of SiO2 buffer layer on the properties of ITO films were researched. The properties of ITO films were studied using X-ray diffraction (XRD), UV-VIS spectrometer, four-point probe and optical profiler. The results show that the SiO2 interlayer between ITO films and PET results in an increase of X-ray peak intensity of ITO film and a decrease of resistivity to 1.21 × 10-3 Ω·cm; in addition, the transmittance decreases to 85% and the surface is relatively smooth. The resistivity of the ITO films bent to some extent keeps some stability.

源语言英语
页(从-至)443-446
页数4
期刊Xiyou Jinshu Cailiao Yu Gongcheng/Rare Metal Materials and Engineering
38
3
出版状态已出版 - 3月 2009

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Yu, Z., Xiang, L., Li, Y., & Xue, W. (2009). Effects of SiO2 buffer layer on the characteristics of flexible ITO films. Xiyou Jinshu Cailiao Yu Gongcheng/Rare Metal Materials and Engineering, 38(3), 443-446.