Effects of assisting ion energy and current on MgO films fabricated by ion-beam-assisted sputtering deposition

S. Tong; H. N. Liu; X. Li; Z. Wang

doi:10.1179/1432891715Z.0000000001781

Effects of assisting ion energy and current on MgO films fabricated by ion-beam-assisted sputtering deposition

S. Tong, H. N. Liu, X. Li, Z. Wang^*

^*此作品的通讯作者

物理学院

科研成果: 期刊稿件 › 文章 › 同行评审

摘要

MgO films were prepared by ion-beam-assisted sputtering deposition from a metal magnesium target. Effects of assisting ion energy E_a and current density J_a on the orientation and surface morphology of the films were analysed in detail. The results show that moderate E_a and J_a could enhance the crystallinity, but high E_a and J_a can destroy the crystallinity of the films. Assisting ion energy E_a is an important factor for orientation selection, and the formation of (100) orientation needs high Ea and low J_a.

源语言	英语
页（从-至）	702-704
页数	3
期刊	Materials Research Innovations
卷	19
DOI	https://doi.org/10.1179/1432891715Z.0000000001781
出版状态	已出版 - 11月 2015

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title = "Effects of assisting ion energy and current on MgO films fabricated by ion-beam-assisted sputtering deposition",

abstract = "MgO films were prepared by ion-beam-assisted sputtering deposition from a metal magnesium target. Effects of assisting ion energy Ea and current density Ja on the orientation and surface morphology of the films were analysed in detail. The results show that moderate Ea and Ja could enhance the crystallinity, but high Ea and Ja can destroy the crystallinity of the films. Assisting ion energy Ea is an important factor for orientation selection, and the formation of (100) orientation needs high Ea and low Ja.",

keywords = "Ion-beam-assisting deposition, MgO thin film, Orientation selection, Surface morphology, X-ray diffraction",

author = "S. Tong and Liu, {H. N.} and X. Li and Z. Wang",

note = "Publisher Copyright: {\textcopyright} W. S. Maney & Son Ltd 2015.",

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doi = "10.1179/1432891715Z.0000000001781",

language = "English",

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T1 - Effects of assisting ion energy and current on MgO films fabricated by ion-beam-assisted sputtering deposition

AU - Tong, S.

AU - Liu, H. N.

AU - Li, X.

AU - Wang, Z.

N1 - Publisher Copyright: © W. S. Maney & Son Ltd 2015.

PY - 2015/11

Y1 - 2015/11

N2 - MgO films were prepared by ion-beam-assisted sputtering deposition from a metal magnesium target. Effects of assisting ion energy Ea and current density Ja on the orientation and surface morphology of the films were analysed in detail. The results show that moderate Ea and Ja could enhance the crystallinity, but high Ea and Ja can destroy the crystallinity of the films. Assisting ion energy Ea is an important factor for orientation selection, and the formation of (100) orientation needs high Ea and low Ja.

AB - MgO films were prepared by ion-beam-assisted sputtering deposition from a metal magnesium target. Effects of assisting ion energy Ea and current density Ja on the orientation and surface morphology of the films were analysed in detail. The results show that moderate Ea and Ja could enhance the crystallinity, but high Ea and Ja can destroy the crystallinity of the films. Assisting ion energy Ea is an important factor for orientation selection, and the formation of (100) orientation needs high Ea and low Ja.

KW - Ion-beam-assisting deposition

KW - MgO thin film

KW - Orientation selection

KW - Surface morphology

KW - X-ray diffraction

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DO - 10.1179/1432891715Z.0000000001781

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SN - 1432-8917

VL - 19

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EP - 704

JO - Materials Research Innovations

JF - Materials Research Innovations

ER -

Effects of assisting ion energy and current on MgO films fabricated by ion-beam-assisted sputtering deposition

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