Effects of assisting ion energy and current on MgO films fabricated by ion-beam-assisted sputtering deposition

S. Tong; H. N. Liu; X. Li; Z. Wang

doi:10.1179/1432891715Z.0000000001781

Effects of assisting ion energy and current on MgO films fabricated by ion-beam-assisted sputtering deposition

S. Tong, H. N. Liu, X. Li, Z. Wang^*

^*Corresponding author for this work

School of Physics

Research output: Contribution to journal › Article › peer-review

Abstract

MgO films were prepared by ion-beam-assisted sputtering deposition from a metal magnesium target. Effects of assisting ion energy E_a and current density J_a on the orientation and surface morphology of the films were analysed in detail. The results show that moderate E_a and J_a could enhance the crystallinity, but high E_a and J_a can destroy the crystallinity of the films. Assisting ion energy E_a is an important factor for orientation selection, and the formation of (100) orientation needs high Ea and low J_a.

Original language	English
Pages (from-to)	702-704
Number of pages	3
Journal	Materials Research Innovations
Volume	19
DOIs	https://doi.org/10.1179/1432891715Z.0000000001781
Publication status	Published - Nov 2015

Keywords

Ion-beam-assisting deposition
MgO thin film
Orientation selection
Surface morphology
X-ray diffraction

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10.1179/1432891715Z.0000000001781

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title = "Effects of assisting ion energy and current on MgO films fabricated by ion-beam-assisted sputtering deposition",

abstract = "MgO films were prepared by ion-beam-assisted sputtering deposition from a metal magnesium target. Effects of assisting ion energy Ea and current density Ja on the orientation and surface morphology of the films were analysed in detail. The results show that moderate Ea and Ja could enhance the crystallinity, but high Ea and Ja can destroy the crystallinity of the films. Assisting ion energy Ea is an important factor for orientation selection, and the formation of (100) orientation needs high Ea and low Ja.",

keywords = "Ion-beam-assisting deposition, MgO thin film, Orientation selection, Surface morphology, X-ray diffraction",

author = "S. Tong and Liu, {H. N.} and X. Li and Z. Wang",

note = "Publisher Copyright: {\textcopyright} W. S. Maney & Son Ltd 2015.",

year = "2015",

month = nov,

doi = "10.1179/1432891715Z.0000000001781",

language = "English",

volume = "19",

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journal = "Materials Research Innovations",

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T1 - Effects of assisting ion energy and current on MgO films fabricated by ion-beam-assisted sputtering deposition

AU - Tong, S.

AU - Liu, H. N.

AU - Li, X.

AU - Wang, Z.

N1 - Publisher Copyright: © W. S. Maney & Son Ltd 2015.

PY - 2015/11

Y1 - 2015/11

N2 - MgO films were prepared by ion-beam-assisted sputtering deposition from a metal magnesium target. Effects of assisting ion energy Ea and current density Ja on the orientation and surface morphology of the films were analysed in detail. The results show that moderate Ea and Ja could enhance the crystallinity, but high Ea and Ja can destroy the crystallinity of the films. Assisting ion energy Ea is an important factor for orientation selection, and the formation of (100) orientation needs high Ea and low Ja.

AB - MgO films were prepared by ion-beam-assisted sputtering deposition from a metal magnesium target. Effects of assisting ion energy Ea and current density Ja on the orientation and surface morphology of the films were analysed in detail. The results show that moderate Ea and Ja could enhance the crystallinity, but high Ea and Ja can destroy the crystallinity of the films. Assisting ion energy Ea is an important factor for orientation selection, and the formation of (100) orientation needs high Ea and low Ja.

KW - Ion-beam-assisting deposition

KW - MgO thin film

KW - Orientation selection

KW - Surface morphology

KW - X-ray diffraction

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U2 - 10.1179/1432891715Z.0000000001781

DO - 10.1179/1432891715Z.0000000001781

M3 - Article

AN - SCOPUS:84948144029

SN - 1432-8917

VL - 19

SP - 702

EP - 704

JO - Materials Research Innovations

JF - Materials Research Innovations

ER -

Effects of assisting ion energy and current on MgO films fabricated by ion-beam-assisted sputtering deposition

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Keywords

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