Control of surface ablation on fused silica with ultrafast laser double-pulse based on seed electrons dynamics control

K. H. Zhang, X. Li*, W. L. Rong, P. Ran, B. Li, P. Feng, Q. Q. Yang

*此作品的通讯作者

科研成果: 书/报告/会议事项章节会议稿件同行评审

2 引用 (Scopus)

摘要

The influence of pulse-separation (τs) between a pair of temporally separated femtosecond laser pulses (with near ablation-threshold energy) on surface ablation of SiO2 were experimentally studied. A τs range of τs≤20 ps was considered. It was shown that a τs-independent/-dependent crater ablation area can be flexibly controlled. Once the pulse energy of the pulse pair exceeds a threshold value, crater ablation area become quasi-τ,s-independent at τs> ∼1 ps. This τs-independent phenomenon can even be observed when each pulse within the double-pulse pair has a sub-threshold energy, which leads to a further reduction in ablation size. The experimental findings have not only confirmed our previous calculation based on a modified model, but also greatly extended the results both quantitatively and qualitatively. A dominant amount of seed electron from photoionization of self-trapped excitons (STEs) is responsible for the appearance of τs-independent phenomena. For physical interest, it is inferred that destruction of STEs will tend to break the τs-independent ablation phenomena. Experiments performed on CdWO4, a material exhibiting similar electron dynamics to that in SiO2 but a faster decay in STE population, support this conjecture. A possible improvement for the relevant theoretical modeling is also suggested based on the experimental findings.

源语言英语
主期刊名AOPC 2015
主期刊副标题Micro/Nano Optical Manufacturing Technologies; and Laser Processing and Rapid Prototyping Techniques
编辑Minghui Hong, Lin Li, Lan Jiang
出版商SPIE
ISBN(电子版)9781628418989
DOI
出版状态已出版 - 2015
活动Applied Optics and Photonics, China: Micro/Nano Optical Manufacturing Technologies; and Laser Processing and Rapid Prototyping Techniques, AOPC 2015 - Beijing, 中国
期限: 5 5月 20157 5月 2015

出版系列

姓名Proceedings of SPIE - The International Society for Optical Engineering
9673
ISSN(印刷版)0277-786X
ISSN(电子版)1996-756X

会议

会议Applied Optics and Photonics, China: Micro/Nano Optical Manufacturing Technologies; and Laser Processing and Rapid Prototyping Techniques, AOPC 2015
国家/地区中国
Beijing
时期5/05/157/05/15

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