Control of surface ablation on fused silica with ultrafast laser double-pulse based on seed electrons dynamics control

K. H. Zhang, X. Li*, W. L. Rong, P. Ran, B. Li, P. Feng, Q. Q. Yang

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

2 Citations (Scopus)

Abstract

The influence of pulse-separation (τs) between a pair of temporally separated femtosecond laser pulses (with near ablation-threshold energy) on surface ablation of SiO2 were experimentally studied. A τs range of τs≤20 ps was considered. It was shown that a τs-independent/-dependent crater ablation area can be flexibly controlled. Once the pulse energy of the pulse pair exceeds a threshold value, crater ablation area become quasi-τ,s-independent at τs> ∼1 ps. This τs-independent phenomenon can even be observed when each pulse within the double-pulse pair has a sub-threshold energy, which leads to a further reduction in ablation size. The experimental findings have not only confirmed our previous calculation based on a modified model, but also greatly extended the results both quantitatively and qualitatively. A dominant amount of seed electron from photoionization of self-trapped excitons (STEs) is responsible for the appearance of τs-independent phenomena. For physical interest, it is inferred that destruction of STEs will tend to break the τs-independent ablation phenomena. Experiments performed on CdWO4, a material exhibiting similar electron dynamics to that in SiO2 but a faster decay in STE population, support this conjecture. A possible improvement for the relevant theoretical modeling is also suggested based on the experimental findings.

Original languageEnglish
Title of host publicationAOPC 2015
Subtitle of host publicationMicro/Nano Optical Manufacturing Technologies; and Laser Processing and Rapid Prototyping Techniques
EditorsMinghui Hong, Lin Li, Lan Jiang
PublisherSPIE
ISBN (Electronic)9781628418989
DOIs
Publication statusPublished - 2015
EventApplied Optics and Photonics, China: Micro/Nano Optical Manufacturing Technologies; and Laser Processing and Rapid Prototyping Techniques, AOPC 2015 - Beijing, China
Duration: 5 May 20157 May 2015

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume9673
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Conference

ConferenceApplied Optics and Photonics, China: Micro/Nano Optical Manufacturing Technologies; and Laser Processing and Rapid Prototyping Techniques, AOPC 2015
Country/TerritoryChina
CityBeijing
Period5/05/157/05/15

Keywords

  • Ablation threshold
  • Double pulse
  • Femtosecond laser
  • Ionization
  • Pulse shaping
  • Seed electrons

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